PHOTON INDUCED FORMATION OF METAL COMPRISING ELONGATED NANOSTRUCTURES

• US 20120107550A1
• Filed: 01/04/2012
• Published: 05/03/2012
• Est. Priority Date: 07/05/2007
• Status: Active Grant

• Current Assignee: IMEC International, Katholieke Universiteit Leuven
• Original Assignee: IMEC International, Katholieke Universiteit Leuven
• Inventors: Dictus, Dries
• Granted Patent: US 8,545,595 B2
• Time in Patent Office: Days
• US Class Current: 428/76
• CPC Class Codes: H01L 21/32136 using plasmas
• CPC Class Codes: Y10T 428/239 Complete cover or casing

Abstract

The preferred embodiments provide a method for forming at least one metal comprising elongated nanostructure on a substrate. The method comprises exposing a metal halide compound surface to a photon comprising ambient to initiate formation of the at least one metal comprising elongated nanostructure. The preferred embodiments also provide metal comprising elongated nanostructures obtained by the method according to preferred embodiments.

Claims

1. A metal comprising elongated nanostructure having a shell and a core, and comprising a combination of a metal and a metal halide, wherein the core of the elongated nanostructure comprises the metal and wherein the shell of the elongated nanostructure comprises the metal halide and substantially completely surrounds the core.

2. The metal comprising elongated nanostructure of claim 1, wherein the metal comprising elongated nanostructure comprises from about 60% to about 99% metal and from about 1% to about 40% metal halide.

3. The metal comprising elongated nanostructure of claim 2, wherein the metal comprising elongated nanostructure comprises more than about 95% metal and less than about 5% metal halide.

4. The metal comprising elongated nanostructure of claim 1, the metal comprising elongated nanostructure having a length and a diameter, wherein the length of the metal comprising elongated nanostructure is from about 500 nm to about 40 μ

m and wherein the diameter of the metal comprising elongated nanostructure is from about 50 nm to about 200 nm.

5. The metal comprising elongated nanostructure of claim 1, wherein the metal is copper and the metal halide is a copper halide.

6. The metal comprising elongated nanostructure of claim 5, wherein the copper halide is CuCl_x or CuBr_x.

7. The metal comprising elongated nanostructure of claim 1, wherein the metal comprising elongated nanostructure is a metal comprising nanowire.

8. The metal comprising elongated nanostructure of claim 1, wherein the metal is copper and the elongated nanostructure is a copper comprising elongated nanostructure, and wherein the core comprises at least a copper surface layer.

9. The metal comprising elongated nanostructure of claim 1, wherein the metal halide is CuCl_x.

10. The metal comprising elongated nanostructure of claim 1, wherein the metal halide is CuBr_x.

11. The metal comprising elongated nanostructure of claim 1, wherein the core comprises a metal surface layer on a substrate.

12. The metal comprising elongated nanostructure of claim 11, wherein at least one of a protective layer and a barrier layer is situated between the metal surface layer and the substrate.

13. The metal comprising elongated nanostructure of claim 11, wherein the metal surface layer is patterned.

14. The metal comprising elongated nanostructure of claim 11, wherein the metal surface layer comprises at least one hole.

15. The metal comprising elongated nanostructure of claim 1, wherein the core of the elongated nanostructure consists essentially of the metal and wherein the shell of the elongated nanostructure consists essentially of the metal halide and completely surrounds the core.

16. The metal comprising elongated nanostructure of claim 1, wherein a length of the metal comprising elongated nanostructure is from about 500 nm to about 40 μ

m.

17. The metal comprising elongated nanostructure of claim 1, wherein a diameter of the metal comprising elongated nanostructure is from about 50 nm to about 200 nm.