Gallium Nitride Semiconductor Structures with Compositionally-Graded Transition Layer
6 Assignments
0 Petitions
Accused Products
Abstract
The invention provides semiconductor materials including a gallium nitride material layer formed on a silicon substrate and methods to form the semiconductor materials. The semiconductor materials include a transition layer formed between the silicon substrate and the gallium nitride material layer. The transition layer is compositionally-graded to lower stresses in the gallium nitride material layer which can result from differences in thermal expansion rates between the gallium nitride material and the substrate. The lowering of stresses in the gallium nitride material layer reduces the tendency of cracks to form. Thus, the invention enables the production of semiconductor materials including gallium nitride material layers having few or no cracks. The semiconductor materials may be used in a number of microelectronic and optical applications.
2 Citations
35 Claims
-
1-15. -15. (canceled)
-
16. A semiconductor structure comprising:
-
a transition layer over a silicon substrate; a gallium nitride material layer over said transition layer; wherein a composition of said transition layer at a top surface thereof substantially matches a composition of said gallium nitride material layer at a bottom surface thereof. - View Dependent Claims (17, 18, 19, 20, 21, 22, 23, 24, 25, 26, 27, 28, 29, 30, 31, 32)
-
-
33. A semiconductor FET comprising:
-
a transition layer comprising AlxGa(1-X)N over an intermediate layer, said intermediate layer being over a silicon substrate; a gallium nitride material layer over said transition layer; wherein a composition of said transition layer at a top surface thereof substantially matches a composition of said gallium nitride material layer at a bottom surface thereof. - View Dependent Claims (34, 35)
-
Specification