MEASUREMENT SYSTEM FOR THE WIRELESS POSITION-INDEPENDENT MEASUREMENT OF THE TEMPERATURE

• US 20120143559A1
• Filed: 08/19/2010
• Published: 06/07/2012
• Est. Priority Date: 08/19/2009
• Status: Active Grant

• Current Assignee: Vectron International GmbH (Knowles Corporation)
• Original Assignee: Vectron International GmbH (Knowles Corporation)
• Inventors: Wall, Bert, Gruenwald, Richard
• Granted Patent: US 8,930,160 B2
• Time in Patent Office: Days
• US Class Current: 702/130
• CPC Class Codes: G01K 11/265 using surface acoustic wave [SAW]
• CPC Class Codes: G01K 7/32 using change of resonant frequency of a crystal

Abstract

The invention relates to a measurement system for the wireless and position-independent measurement of the temperature of the load of an oven with high accuracy using passive temperature probes. The measurement system for the wireless measurement of the temperature of food or workpieces in ovens has an interrogation unit located outside the oven chamber, one or more interrogation antennas located in the oven chamber and at least one passively operated temperature probe with a probe antenna and at least one temperature sensor designed as a resonator, said temperature probe being freely movable within the oven, characterized in that the temperature sensor has at least two resonances with different temperature coefficients of frequency, wherein the electrical equivalent circuit diagrams of the resonance elements differ only slightly from each other.

Claims

1. A system for the wireless measurement of the temperature of the load in an oven having:

an interrogation unit,

one or more interrogation antennas that can be positioned within the oven chamber,

a passively operated temperature probe with a probe antenna and with at least one temperature sensor designed as a resonator, wherein the temperature probe can be positioned within the oven chamber,

an evaluation unit,

wherein the temperature sensor has at least a first resonance element and a second resonance element,

wherein

the evaluation unit is designed to determine the temperature of the load of the oven from the difference between the resonant frequency of the first resonance element and the resonant frequency of the second resonance element, wherein

the first resonance element and the second resonance element are designed in such a manner that the dynamic resistance, the motional inductance and the motional capacitance of the first resonance element differ by less than 20% each from the dynamic resistance, the motional inductance and the motional capacitance of the second resonance element at 20°

C.

2. The system according to claim 1, wherein the motional capacitance of the first resonance element differs from the motional capacitance of the second resonance element by less than 10% a time.

3. The system according to claim 1, wherein the motional capacitance of the first resonance element differs from the motional capacitance of the second resonance element by less than 7% a time.

4. The system according to claim 1, wherein the motional capacitance of the first resonance element differs from the motional capacitance of the second resonance element by less than 4% a time.

5. The system according to claim 1, wherein the dynamic resistance of the first resonance element differs from the dynamic resistance of the second resonance element and/or the motional inductance of the first resonance element differs from the motional inductance of the second resonance element and/or the motional capacitance of the first resonance element differs from the motional capacitance of the second resonance element.

6. The system according to claim 1, wherein the product of the motional inductance and the motional capacitance of the first resonance element differs from the product of the motional inductance and the motional capacitance of the second resonance element by at least 0.05% in the temperature range between 0°

C. and 250°

C.

7. The system according to claim 1, wherein the resonant frequency of the first resonance element differs from the resonant frequency of the second resonance element in the entire temperature range of 20°

C. to 200°

C.

8. The system according to claim 1, wherein there is a steadily increasing or steadily decreasing difference of the resonant frequencies of the resonance elements in the range of 20°

C. to 200°

C.

9. The system according to claim 1, wherein there is a linearly increasing or linearly decreasing difference of the resonant frequencies of the resonance elements in the range of 20°

C. to 200°

C.

10. The system according to claim 1, wherein the amount of the derivative of the resonant frequency with respect to the temperature of the first resonance element is greater than the amount of the derivative of the resonant frequency with respect to the temperature of the second resonance element in the entire range of 20°

C. to 200°

C.

11. The system according to claim 1, wherein the amount of the derivative of the resonant frequency with respect to the temperature of the first resonance element is smaller than the amount of the derivative of the resonant frequency with respect to the temperature of the second resonance element in the entire range of 20°

C. to 200°

C.

12. The system according to claim 1, wherein the resonance elements are designed as surface-acoustic-wave resonators or that the resonance elements are designed as bulk-acoustic-wave resonators.