LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
1 Assignment
0 Petitions
Accused Products
Abstract
A map of the surface of a substrate is generated at a measurement station. The substrate is then moved to where a space between a projection lens and the substrate is filled with a liquid. The substrate is then aligned using, for example, a transmission image sensor and, using the previous mapping, the substrate can be accurately exposed. Thus the mapping does not take place in a liquid environment.
2 Citations
4 Claims
-
1-3. -3. (canceled)
-
4. A lithographic apparatus comprising:
-
an exposure station including a projection system configured to project a patterned beam of radiation through liquid onto a target portion of a substrate held on a first substrate table; a measurement station configured to measure a substrate held on a second substrate table, wherein measurement of the substrate at the measurement station is not performed through said liquid adjacent the substrate; and a positioning system configured to move the second substrate table from the measurement station to the exposure station so as to position the substrate held on the second substrate table into an optical path of the projection system.
-
Specification