HIGH PRODUCTIVITY VAPOR PROCESSING SYSTEM

• US 20130133580A1
• Filed: 11/29/2011
• Published: 05/30/2013
• Est. Priority Date: 11/29/2011
• Status: Active Grant

• Current Assignee: Intermolecular Incorporated
• Original Assignee: Intermolecular Incorporated
• Inventors: Wright, Jason
• Granted Patent: US 8,900,364 B2
• Time in Patent Office: Days
• US Class Current: 118/725
• CPC Class Codes: C23C 16/4412 Details relating to the exhausts, e.g. pumps, filters, scrubbers, particle traps
• CPC Class Codes: C23C 16/45565 Shower nozzles

Abstract

A processing chamber is provided. The processing chamber includes a lid having a plurality of valves affixed thereto, the plurality of valves operable to enable process gases to flow into the chamber. The chamber includes a bottom portion, where the bottom portion includes a base and side walls extending from the base. A surface of the base is configured to support a substrate. A showerhead is affixed to a bottom surface of the lid. A bottom surface of the showerhead is configured to include a central port for providing process gases into the chamber. The central port is surrounded by an annular pump channel. The annular pump channel is surrounded by an annular purge channel, where a first ridge separates the delivery region and the annular pump channel and a second ridge separates the annular pump channel and the annular purge channel.

Claims

1. A processing chamber, comprising:

a lid having a plurality of valves affixed thereto, the plurality of valves operable to enable process gases to flow into the chamber;

a bottom portion, the bottom portion including a base and side walls extending from the base, wherein a surface of the base is configured to support a substrate; and

a showerhead affixed to a bottom surface of the lid, a bottom surface of the showerhead configured to include a central port for providing process gases into the chamber, the central port surrounded by an annular pump channel, the annular pump channel surrounded by a purge channel, wherein a first ridge separates the delivery region and the annular pump channel and a second ridge separates the annular pump channel and the purge channel.

2. The processing chamber of claim 1, wherein the first ridge extends from a surface of the showerhead by a first length and wherein the second ridge extends from the surface of the showerhead by a second length, wherein the second length is greater than the first length.

3. The processing chamber of claim 1, wherein the base includes a heater.

4. The processing chamber of claim 1, wherein the annular pump channel comprises a plurality of segmented channels.

5. The processing chamber of claim 1, wherein the annular pump channel is segmented in four equivalent sections.

6. The processing chamber of claim 1, wherein the bottom surface of the lid includes a delivery port configured to mate with the central port of the showerhead.

7. The processing chamber of claim 1, wherein the showerhead includes a diffuser plate.

8. The processing chamber of claim 7, wherein the diffuser plate is disposed within a region surrounded by the annular pump channel.

9. The processing chamber of claim 1, wherein all process gasses, vacuum, and utilities to operate the processing chamber are delivered through the lid.

10. A processing chamber, comprising:

a lid having a plurality of valves affixed thereto, the plurality of valves operable to enable process gases to flow into the chamber;

a bottom portion, the bottom portion including a base and side walls extending from the base, wherein a surface of the base extending between each of the side walls is configured to support a substrate;

a showerhead affixed to a bottom surface of the lid, a bottom surface of the showerhead having a central port for providing process gases into the chamber, the central port surrounded by an annular pump channel, the annular pump channel surrounded by an annular purge channel, wherein a first ridge separates the delivery region and the annular pump channel and a second ridge separates the annular pump channel and the annular purge channel;

a precursor line coupled to an inlet port of the lid;

an oxidizer line coupled to inlet port of the lid; and

a purge line shared by the precursor line and the oxidizer line.

11. The processing chamber of claim 10, wherein the first ridge extends from a surface of the showerhead by a first length and wherein the second ridge extends from the surface of the showerhead by a second length, wherein the second length is greater than the first length.

12. The processing chamber of claim 10, wherein the showerhead includes a diffuser disposed over the central port.

13. The processing chamber of claim 10, wherein the annular pump channel comprises a plurality of segmented channels.

14. The processing chamber of claim 10, wherein the base includes a heater.

15. The processing chamber of claim 10, wherein the annular purge channel comprises a plurality of holes spaced apart from each other.

16. The processing chamber of claim 10, wherein one of the side walls includes an aperture into a processing region of the chamber.

17. The processing chamber of claim 16, wherein pressure in the processing region is monitored through the aperture.

18. The processing chamber of claim 10, wherein a top surface of the base is stationary.

19. The processing chamber of claim 10, wherein all process gasses, vacuum, and utilities to operate the processing chamber are delivered through the lid.

20. The processing chamber of claim 10, wherein the annular pump channel is segmented in four equivalent sections.