DEPOSITION METHOD

• US 20130280414A1
• Filed: 12/15/2010
• Published: 10/24/2013
• Est. Priority Date: 12/15/2010
• Status: Active Grant

• Current Assignee: Fuchita Nanotechnology Ltd.
• Original Assignee: Fuchita Nanotechnology Ltd.
• Inventors: Fuchita, Eiji, Ozawa, Eiichi, Tokizaki, Eiji
• Granted Patent: US 8,877,297 B2
• Time in Patent Office: Days
• US Class Current: 427/58
• CPC Class Codes: B05B 7/1404 Arrangements for supplying particulate material
• CPC Class Codes: C23C 24/04 Impact or kinetic deposition of particles

Abstract

[Object] To provide a deposition method that enables fine particles having a relatively large particle diameter (at least larger than 0.5 μm diameter) to be more stably deposited on a substrate by using a simple configuration.

[Solving Means] In the deposition method, fine particles P whose surface is at least insulative are placed in an airtight container 2, and a carrier gas is introduced into the container, thereby triboelectrically charging the fine particles and generating an aerosol A of the fine particles. The fine particles in question are charged by friction with the inner surface of a transfer tubing 6 connected to the container, and the aerosol is conveyed via such tubing to a deposition chamber 3 which is maintained at a pressure lower than that in the airtight container. The charged fine particles are deposited on a substrate S placed in the deposition chamber.

Claims

1. A deposition method, comprising:

placing fine particles whose surface is at least insulative in an airtight container;

generating an aerosol of the fine particles while triboelectrically charging the fine particles by introducing a carrier gas into the airtight container;

transporting the aerosol via a transfer tubing to a deposition chamber which is maintained at a pressure lower than that in the airtight container while charging the fine particles by friction with the inner surface of the transfer tubing connected to the airtight container and having a nozzle at the tip; and

depositing the charged fine particles on a substrate placed in the deposition chamber by spraying the aerosol from the nozzle.

2. The deposition method according to claim 1, wherein

an inner surface of the nozzle is coated with a conductive carbide or ultrahard material.

3. The deposition method according to claim 1, wherein

a flow rate of the carrier gas to be introduced into the airtight container is 58 m/s or more.

4. The deposition method according to claim 3, wherein

an opening of the nozzle is formed to have a slot shape having a length 10 times or more and 1000 times or less its width.

5. The deposition method according to claim 1, wherein

the fine particles are deposited on the substrate while reciprocating the substrate in the deposition chamber at a movement rate of 5 mm/s or more.

6. The deposition method according to claim 1, wherein

the fine particles have a mean particle diameter of 0.5 μ

m or more and 10 μ

m or less.