AUTO-SEQUENCING MULTI-DIRECTIONAL INLINE PROCESSING METHOD
First Claim
1. A method for auto-sequencing operation of a dual-load processing system having a controller, wherein the processing system comprises a vacuum processing chamber that has two loading ports on two opposing sides of the vacuum processing chamber, and two loadlock chambers, each loadlock chamber coupled to one of the two ports via a vacuum valve, comprising:
- when fresh substrates are introduced into one of the loadlock chambers, initiating vacuum at that loadlock chamber;
when a desired vacuum level is achieved at one of the loadlock chambers, sending a ready signal to the controller, indicating that loadlock chamber is ready for substrates exchange;
when processing is completed in the vacuum processing chamber, causing the controller to determine which loadlock chamber has sent a ready signal and initiating substrates exchange with the loadlock chamber that has sent a ready signal.
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Accused Products
Abstract
A method for auto-sequencing of plasma processing system for concurrent processing of several substrates. The method autonomously sequence processing and move substrates in different directions as necessary. The method moves two substrate trays together into the processing chamber for substrate exchange, and remove the trays from the chamber one at a time. When needed, the method moves one tray into the processing chamber for removal of the susceptor without exposing the chamber to atmospheric environment.
13 Citations
18 Claims
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1. A method for auto-sequencing operation of a dual-load processing system having a controller, wherein the processing system comprises a vacuum processing chamber that has two loading ports on two opposing sides of the vacuum processing chamber, and two loadlock chambers, each loadlock chamber coupled to one of the two ports via a vacuum valve, comprising:
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when fresh substrates are introduced into one of the loadlock chambers, initiating vacuum at that loadlock chamber; when a desired vacuum level is achieved at one of the loadlock chambers, sending a ready signal to the controller, indicating that loadlock chamber is ready for substrates exchange; when processing is completed in the vacuum processing chamber, causing the controller to determine which loadlock chamber has sent a ready signal and initiating substrates exchange with the loadlock chamber that has sent a ready signal. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18)
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Specification