THIN-FILM COATINGS, ELECTRO-OPTIC ELEMENTS AND ASSEMBLIES INCORPORATING THESE ELEMENTS

• US 20140071513A1
• Filed: 09/10/2013
• Published: 03/13/2014
• Est. Priority Date: 03/03/2006
• Status: Active Grant

• Current Assignee: Gentex Corporation
• Original Assignee: Gentex Corporation
• Inventors: Neuman, George A., Tonar, William L., Anderson, John S., Forgette, Jeffrey A., Cammenga, David J., Luten, Henry A., Frasher, Scott D.
• Granted Patent: US 8,873,127 B2
• Time in Patent Office: Days
• US Class Current: 359/274
• CPC Class Codes: B60R 1/084 using a removable filtering or hiding screen associated with windows or windscreens B60J3/00
• CPC Class Codes: G02B 5/0808 having a single reflecting layer G02B5/0883, G02B5/0891 take precedence
• CPC Class Codes: G02F 1/0018 Electro-optical materials
• CPC Class Codes: G02F 1/155 Electrodes
• CPC Class Codes: G02F 1/157 Structural association of cells with optical devices, e.g. reflectors or illuminating devices
• CPC Class Codes: Y10T 428/24355 Continuous and nonuniform or irregular surface on layer or component [e.g., roofing, etc.]
• CPC Class Codes: Y10T 428/2495 Thickness [relative or absolute]

Abstract

Electro-optic elements are becoming commonplace in a number of vehicular and architectural applications. Various electro-optic element configurations provide variable transmittance and or variable reflectance for windows and mirrors. The present invention relates to various thin-film coatings, electro-optic elements and assemblies incorporating these elements.

Claims

1. An optical substrate comprising

a first surface;

a second surface;

wherein at least one of said first surface and said second surface carries a layer of indium-tin-oxide (ITO) having;

an optical thickness of at least approximately a half-wave;

a bulk resistance of approximately 170 micro-Ohm*cm or less; and

an absorption of approximately 4.1 percent or less;

wherein the optical substrate has a thickness between said first surface and said second surface of approximately 2.3 mm or less; and

wherein said surface carrying said ITO layer has an optical power corresponding to an absolute value of optical magnification between approximately 0.97 and approximately 1.0, as defined in reflection.

2. The optical substrate of claim 1, wherein said value of optical magnification is between approximately 0.98 and approximately 1.0, as defined in reflection.

3. The optical substrate of claim 1, wherein said layer of ITO has a sheet resistance of less approximately 11.0 Ohms/sq or less at an optical thickness of approximately a half-wave.

4. The optical substrate of claim 1, wherein said layer of ITO has a bulk resistance of 160 micro-Ohms*cm or less

5. The optical substrate of claim 1, wherein said layer of ITO has a bulk resistance of approximately 140 micro-Ohms*cm or less.

6. The optical substrate of claim 1, wherein said ITO layer has an absorption of approximately 2.5 percent or less.

7. The optical substrate of claim 1, wherein the thickness of said surface carrying said ITO layer is approximately 1.6 mm or less.

8. The optical substrate of claim 1 being one of a first substrate and a second substrate in an electrochromic element, wherein said first substrate and said second substrate define a gap, and an electrochromic medium is within said gap.

9. The optical substrate of claim 8, wherein said electrochromic element is a mirror.

10. The optical substrate of claim 8, wherein said electrochromic element is a window.

11. An optical substrate comprising

a first surface;

a second surface;

wherein at least one of said first surface and said second surface carries a layer of indium-tin-oxide (ITO) having;

an optical thickness of at least about 2 waves;

a bulk resistance of approximately 170 micro-Ohm-cm or less;

a sheet resistance of approximately 2.5 Ohms/sq or less; and

an absorption of approximately 18 percent or less;

wherein the optical substrate has a thickness of approximately 2.3 mm or less; and

wherein said surface with said ITO layer deposited therein has an optical power corresponding to an absolute value of optical magnification between approximately 0.85 and approximately 1.0, as defined in reflection.

12. The optical substrate of claim 11, wherein said value of optical magnification is between approximately 0.95 and approximately 1.0, as defined in reflection.

13. The optical substrate of claim 11, wherein said value of optical magnification is between approximately 0.97 and approximately 1.0, as defined in reflection.

14. The optical substrate of claim 11, wherein said layer of ITO has a sheet resistance of less than approximately 2.0 Ohms.

15. The optical substrate of claim 11, wherein said layer of ITO has a bulk resistance of approximately 150 micro-Ohms*cm or less.

16. The optical substrate of claim 11, wherein said layer of ITO has a bulk resistance of approximately 130 micro-Ohms*cm or less

17. The optical substrate of claim 11, wherein said ITO layer has an absorption of approximately 15 percent or less.

18. The optical substrate of claim 11, wherein said ITO layer has an absorption of approximately 12 percent or less.

19. The optical substrate of claim 11, wherein the thickness of said surface carrying said ITO layer is approximately 1.6 mm or less

20. The optical substrate of claim 11, wherein the thickness of said surface carrying said ITO layer is approximately 0.95 mm or less.

21. The optical substrate of claim 11 being one of a first substrate and a second substrate in an electrochromic element, wherein said first substrate and said second substrate define a gap, and an electrochromic medium is within said gap.

22. The optical substrate of claim 21, wherein said electrochromic element is a mirror.

23. The optical substrate of claim 21, wherein said electrochromic element is a window.

24. The optical substrate of claim 11, wherein said surface carrying said layer of ITO having a haze of approximately 1.5% or less.

25. The optical substrate of claim 11, wherein said surface carrying said layer of ITO having roughness of approximately 200 angstroms or less.

34. The optical substrate of claim 25, wherein said thickness approximately 1.6 mm or less.

26. An optical substrate comprising

a first surface;

a second surface;

wherein at least one of said first surface and said second surface carries a layer of indium-tin-oxide (ITO) having;

a bulk resistance of approximately 170 micro-Ohm*cm or less; and

an absorption per nanometer of ITO of approximately 3.0e−

2 percent/nm or less;

wherein the optical substrate has a thickness between said first surface and said second surface of approximately 2.3 mm or less; and

wherein said surface with said ITO layer deposited therein has an optical power corresponding to an absolute value of optical magnification between approximately 0.95 and approximately 1.0, as defined in reflection.

27. The optical substrate of claim 26, wherein said absorption per nanometer of ITO of approximately 1.8e−

2 percent/nm or less.

28. The optical substrate of claim 26, wherein said value of optical magnification is between approximately 0.97 and approximately 1.0, as defined in reflection.

29. The optical substrate of claim 26, wherein said layer of ITO has a sheet resistance of approximately 2.5 Ohms/sq or less.

30. The optical substrate of claim 29, wherein said optical thickness of said ITO is at least approximately 2 waves.

31. The optical substrate of claim 30, wherein said ITO layer has an absorption of approximately 12 percent or less.

32. The optical substrate of claim 26, wherein said layer of ITO has a thickness of approximately half-wave and a sheet resistance of approximately 11 Ohms/sq or less.

33. The optical substrate of claim 26, wherein said layer of ITO has a bulk resistance of less than approximately 150 micro-Ohms*cm.

35. The optical substrate of claim 26, wherein said thickness is approximately 0.95 mm or less.

36. The optical substrate of claim 26 being one of a first substrate and a second substrate in an electrochromic element, wherein said first substrate and said second substrate define a gap, and an electrochromic medium is within said gap.

37. The optical substrate of claim 36, wherein said electrochromic element is a mirror.

38. The optical substrate of claim 36, wherein said electrochromic element is a window.

39. The optical substrate of claim 26, wherein said surface carrying said layer of ITO having a haze less than approximately 1.5%.

40. The optical substrate of claim 26, wherein said surface carrying said layer of ITO having roughness of 200 angstroms or less.