DRIVING DEVICE OF DISPLAY APPARATUS AND METHOD OF MANUFACTURING THE DRIVING DEVICE

• US 20140131744A1
• Filed: 11/13/2013
• Published: 05/15/2014
• Est. Priority Date: 11/13/2012
• Status: Active Grant

• Current Assignee: Samsung Electronics Co. Ltd.
• Original Assignee: Samsung Electronics Co. Ltd.
• Inventors: SHIM, Dong-sik, KIM, Woon-bae, CHOI, Hyung
• Granted Patent: US 9,110,318 B2
• Time in Patent Office: Days
• US Class Current: 257/88
• CPC Class Codes: G02B 26/02 for controlling the intensity of light G02B26/004 takes precedence
• CPC Class Codes: G02F 1/13 based on liquid crystals, e.g. single liquid crystal display cells
• CPC Class Codes: G02F 1/136213 Storage capacitors associated with the pixel electrode
• CPC Class Codes: G02F 1/1368 in which the switching element is a three-electrode device G02F1/136277 takes precedence
• CPC Class Codes: H01L 2021/775 comprising a plurality of TFTs on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
• CPC Class Codes: H01L 27/1214 comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
• CPC Class Codes: H01L 27/1259 Multistep manufacturing methods

Abstract

A driving device of a display apparatus, and a method of manufacturing the driving device. The driving device may have a specific structure, and be manufactured in such a manner, because a first electrode of a micro optical switch device may be formed simultaneously with the formation of at least a source region and a drain region, or a gate electrode of an active device and a capacitor electrode.

Claims

1. A driving device of a display apparatus, the driving device comprising:

an active device formed in a first region of a substrate;

a micro optical switch device formed in a second region of the substrate; and

a capacitor formed on the substrate between the active device and the micro optical switch device,

wherein the active device comprises;

a gate electrode formed in the first region of the substrate;

an insulating layer formed on the gate electrode;

an active region formed on the insulating layer above the gate electrode; and

a source region and a drain region respectively formed at either side of the active region, and

wherein the micro optical switch device comprises;

a first electrode formed on the insulating layer in the second region of the substrate; and

a second electrode formed above and spaced apart from the first electrode.

2. The driving device of claim 1, wherein the capacitor comprises a capacitor electrode formed between the active device and the micro optical switch device.

3. The driving device of claim 1, further comprising:

a passivation layer formed on the source region, the drain region, and the first electrode.

4. The driving device of claim 1, wherein the source region, the drain region, and the first electrode are formed of the same material.

5. A driving device of a display apparatus, the driving device comprising:

an active device formed in a first region of a substrate;

a micro optical switch device formed in a second region of the substrate; and

a capacitor formed on the substrate between the active device and the micro optical switch device,

wherein the active device comprises;

a gate electrode formed in the first region of the substrate;

an insulating layer formed on the gate electrode;

an active region formed on the insulating layer above the gate electrode; and

a source region and a drain region respectively formed at either side of the active region, and

wherein the micro optical switch device comprises;

a first electrode formed in the second region on the substrate; and

a second electrode formed above and spaced apart from the first electrode.

6. The driving device of claim 5, wherein the capacitor comprises a capacitor electrode formed between the active device and the micro optical switch device.

7. The driving device of claim 5, further comprising:

a passivation layer formed on the source region, the drain region, and the first electrode.

8. The driving device of claim 5, wherein the gate electrode, the capacitor electrode, and the first electrode are formed of the same material.

9. A method of manufacturing a driving device of a display apparatus, the method comprising:

forming a gate electrode of an active device and a capacitor electrode on a substrate;

forming an active region on an insulating layer above the gate electrode; and

forming a source region and a drain region of the active device, and a first electrode of a micro optical switch device by forming a conductive material layer on the insulating layer and the active region and patterning the conductive material layer.

10. The method of claim 9, wherein the forming the gate electrode further comprises:

forming a conductive material layer on the substrate and patterning the conductive material layer; and

forming the insulating layer.

11. The method of claim 9, further comprising:

forming a passivation layer on the source region, the drain region, and the first electrode using insulating material.

12. The method of claim 11, further comprising:

forming a sacrificial layer on the passivation layer;

forming a second electrode on the sacrificial layer above the first electrode using conductive material; and

removing the sacrificial layer.

13. A method of manufacturing a driving device of a display apparatus, the method comprising:

forming a gate electrode of an active device, a capacitor electrode, and a first electrode of a micro optical switch device by forming a conductive material layer on a substrate and patterning the conductive material layer, and forming an insulating layer;

forming an active region on the insulating layer above the gate electrode; and

forming a source region and a drain region of the active device.

14. The method of claim 13, wherein forming the source region and the drain region further comprises:

forming a conductive material layer on the insulating layer and the active region; and

patterning the conductive material layer.

15. The method of claim 13, further comprising:

forming a passivation layer on the source region, the drain region, and the first electrode using insulating material.

16. The method of claim 14, further comprising:

forming a sacrificial layer on the passivation layer;

forming a second electrode on the sacrificial layer above the first electrode; and

removing the sacrificial layer.

17. A method of manufacturing a driving device, the method comprising:

disposing a first electrode on a substrate at the same time as at least one of a gate electrode and a capacitor electrode, and a source region and a drain region.

disposing an insulating layer, an active region, a passivation layer, and a second electrode on the substrate.

18. A driving device comprising:

a first electrode disposed on a substrate at a same time and layer depth as at least one of a gate electrode and a capacitor electrode, and a source region and a drain region; and

an insulating layer, an active region, a passivation layer, and a second electrode disposed on the substrate.

19. The driving device of claim 18, further comprising;

an active device, in a first region, comprising the gate electrode, part of the insulating layer, the active region, the source region, part of the drain region, and part of the passivation layer;

a micro optical switch device, in a second region, comprising the first electrode, part of the passivation layer, and a second electrode; and

a capacitor, between the active device and micro optical switch device. comprising the capacitor electrode, part of the insulating layer, part of the drain region, and part of the passivation layer.