Method and System for Design of a Reticle to be Manufactured Using Variable Shaped Beam Lithography
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Abstract
A method for optical proximity correction (OPC) is disclosed, in which a set of VSB shots is determined, where the set of shots can approximately form a target reticle pattern that is an OPC-compensated version of an input pattern. The set of shots is simulated to create a simulated reticle pattern. A substrate image is calculated, based on using the simulated reticle pattern in an optical lithographic process to form the substrate image. A system for OPC is also disclosed.
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Citations
37 Claims
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1-16. -16. (canceled)
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17. A method for optical proximity correction (OPC) or mask data processing (MDP) comprising:
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inputting an input pattern; determining a plurality of charged particle beam shots that can approximately form a target pattern on a reticle, wherein the target pattern is an OPC-compensated version of the input pattern; simulating a reticle pattern that will be produced on the reticle from the plurality of charged particle beam shots; and calculating a substrate image which will be formed on a substrate using an optical lithographic process with the simulated reticle pattern, wherein the simulating and the calculating are performed on a computing hardware device. - View Dependent Claims (18, 19, 20, 21, 22, 23, 24, 25, 26, 27, 28, 29)
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30. A system for optical proximity correction (OPC) or mask data processing (MDP) comprising:
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a device configured to input an input pattern; a device configured to determine a plurality of charged particle beam shots that can approximately form a target pattern on a reticle, wherein the target pattern is an OPC-compensated version of the input pattern; a device configured to simulate a reticle pattern that will be produced on the reticle from the plurality of charged particle beam shots; and a device configured to calculate a substrate image which will be formed on a substrate using an optical lithographic process with the simulated reticle pattern. - View Dependent Claims (31, 32, 33, 34, 35, 36, 37)
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Specification