FACET MIRROR
1 Assignment
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Accused Products
Abstract
Illumination optical unit for illuminating an object field in a projection exposure apparatus, comprising a first facet mirror with a structure, which has a spatial frequency of at least 0.2 mm−1 in at least one direction, and a second facet mirror, comprising a multiplicity of facets, wherein the facets are respectively provided with a mechanism for damping spatial frequencies of the structure of the first facet mirror.
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Citations
35 Claims
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1-15. -15. (canceled)
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16. A facet mirror, comprising:
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a multiplicity of facets respectively configured to damp spatial frequencies above a specific limit frequency, wherein the facet mirror is a microlithography facet mirror. - View Dependent Claims (17, 18, 19, 20, 21, 22, 23, 24, 25, 26, 27, 28, 29, 30, 31, 32, 33, 34)
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35. A facet mirror, comprising:
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a multiplicity of facets, wherein, for at least some of the facets, the facet comprises a diffraction structure having a grating period of at most five millimeters, the diffraction structure configured to diffract infrared radiation.
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Specification