CMP PAD DRESSERS HAVING LEVELED TIPS AND ASSOCIATED METHODS

  • US 20150133036A1
  • Filed: 10/03/2014
  • Published: 05/14/2015
  • Est. Priority Date: 05/16/2005
  • Status: Active Grant
First Claim
Patent Images

1. A CMP pad dresser, comprising:

  • a support substrate; and

    a plurality of superabrasive particles secured to the support substrate with each superabrasive particle extending away from the support substrate to a protrusion distance, wherein a highest protruding tip of each of the plurality of superabrasive particles align along a designated profile with a tip variation of from about 5 microns to about 100 microns.

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