OLED Device and Fabrication Method Thereof, Display Substrate

• US 20160233450A1
• Filed: 06/17/2015
• Published: 08/11/2016
• Est. Priority Date: 02/10/2015
• Status: Active Grant

• Current Assignee: Beijing BOE Optoelectronics Technology Co Ltd. (BOE Technology Group Co., Ltd.), BOE Technology Group Co., Ltd.
• Original Assignee: Beijing BOE Optoelectronics Technology Co Ltd. (BOE Technology Group Co., Ltd.), BOE Technology Group Co., Ltd.
• Inventors: Yang, Jiuxia, Liu, Jiantao, Bai, Feng
• Granted Patent: US 9,716,244 B2
• Time in Patent Office: Days
• US Class Current: 1/1
• CPC Class Codes: H10K 50/81 Anodes
• CPC Class Codes: H10K 59/8051 Anodes
• CPC Class Codes: H10K 59/876 comprising a resonant cavity structure, e.g. Bragg reflector pair
• CPC Class Codes: H10K 71/621 Providing a shape to conductive layers, e.g. patterning or selective deposition

Abstract

An OLED device and a fabrication method thereof, a display substrate and a display device are provided. The OLED device comprises: a base substrate, and an anode, an organic light emitting layer and a cathode which are sequentially stacked on the base substrate. The anode includes a silver nanowire material.

Claims

1. An OLED device, comprising:

a base substrate; and

an anode, an organic light emitting layer and a cathode which are sequentially stacked on the base substrate,

wherein the anode includes a silver nanowire material.

2. The OLED device according to claim 1, wherein the OLED device further comprises a protective layer, the protective layer being formed on the anode, and the protective layer including a conductive polymer material.

3. The OLED device according to claim 2, wherein the conductive polymer material includes at least one selected from a group consisted of polyacetylene, polythiophene, polypyrrole, polyaniline, polyphenylene, polyphenylene acetylene, and polydiacetylene.

4. The OLED device according to claim 2, further comprising a hole injection layer and a hole transport layer disposed between the anode and the organic light emitting layer, and an electron transport layer and an electron injection layer disposed between the organic light emitting layer and the cathode.

5. The OLED device according to claim 4, wherein the protective layer is disposed between the anode and the hole injection layer.

6. A display substrate, comprising an OLED device, the OLED device comprising:

a base substrate; and

an anode, an organic light emitting layer and a cathode which are sequentially stacked on the base substrate,

wherein the anode includes a silver nanowire material.

7. The display substrate according to claim 6, wherein the OLED device further comprises a protective layer, the protective layer being formed on the anode, and the protective layer including a conductive polymer material.

8. The display substrate according to claim 7, wherein the conductive polymer material includes at least one selected from a group consisted of polyacetylene, polythiophene, polypyrrole, polyaniline, polyphenylene, polyphenylene acetylene, and polydiacetylene.

9. The display substrate according to claim 7, further comprising a hole injection layer and a hole transport layer disposed between the anode and the organic light emitting layer, and an electron transport layer and an electron injection layer disposed between the organic light emitting layer and the cathode.

10. The display substrate according to claim 9, wherein the protective layer is disposed between the anode and the hole injection layer.

14. The fabrication method according to claim 8, wherein drying and curing the silver nanowire film is performed by a vacuum baking process and a hardening process.

15. The fabrication method according to claim 14, wherein the vacuum baking process and the hardening process include:

placing the base substrate where the silver nanowire film has been formed in a vacuum oven, baking for 30 seconds˜

30 minutes at a temperature of 20˜

50°

C. to dry the silver nanowire film, then baking for 15˜

60 minutes at a temperature of 80˜

250°

C. to cure the silver nanowire film.

20. The fabrication method according to claim 15, wherein, the patterning includes:

coating photoresist on the cured silver nanowire film, drying and curing the photoresist by a vacuum baking process and a hardening process sequentially;

making the silver nanowire film and the photoresist form a pattern of an anode of the OLED device by an exposing process and a developing process sequentially; and

removing the residual photoresist to expose the anode.

11. A fabrication method of an OLED device, comprising:

forming a pattern of a silver nanowire film; and

drying and curing the silver nanowire film, to form an anode of the OLED device.

12. The fabrication method according to claim 11, wherein the pattern of the silver nanowire film is formed by a printing process.

13. The fabrication method according to claim 11, wherein forming the pattern of the silver nanowire film includes:

forming a silver nanowire film on a base substrate by a coating process; and

patterning the silver nanowire film to form the pattern of the silver nanowire film.

16. The fabrication method according to claim 11, wherein, the method further comprises coating a protective layer including a conductive polymer material on the anode.

17. The fabrication method according to claim 16, wherein the conductive polymer material includes at least one selected from a group consisted of polyacetylene, polythiophene, polypyrrole, polyaniline, polyphenylene, polyphenylene acetylene, and polydiacetylene.

18. The fabrication method according to claim 17, wherein, before coating the protective layer including the conductive polymer material on the anode, the conductive polymer material is solubilized by an ionic liquid;

wherein, the ionic liquid includes at least one selected from a group consisted of 1-Ethyl-3-methylimidazolium hexafluorophosphate (C₆H₁₁F₆N₂P) liquid, 1-Butyl-3-methylimidazolium hexafluorophosphate (C₈H₁₅F₆N₂P) liquid, 1-Octyl-3-methylimidazolium hexafluorophosphate (C₁₂H₂₃F₆N₂P) liquid, 1-Ethyl-3-methylimidazolium tetrafluoroborate (C₆H₁₁BF₄N₂) liquid, 1-Butyl-3-methylimidazolium Trifluoromethanesulfonate (C₉H₁₅F₃N₂O₃S) liquid, and 1-Butyl-3-methylimidazolium chloride (C₈H₁₅ClN₂) liquid.

19. The fabrication method according to claim 13, wherein, drying and curing the silver nanowire film is performed before patterning the silver nanowire film.