MULTI-GATE DEVICE AND METHOD OF FABRICATION THEREOF
First Claim
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1. A method of semiconductor device fabrication, comprising:
- forming a fin extending from a substrate, the fin having a source/drain region and a channel region, wherein the fin includes a first epitaxial layer having a first composition and a second epitaxial layer on the first epitaxial layer, the second epitaxial layer having a second composition;
removing the second epitaxial layer from the source/drain region of the fin to form a gap;
filling the gap with a dielectric material; and
while the dielectric material is filling the gap, growing another epitaxial material on at least two surfaces of the first epitaxial layer to form a source/drain feature.
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Abstract
A method of semiconductor device fabrication is described that includes forming a fin extending from a substrate and having a source/drain region and a channel region. The fin includes a first epitaxial layer having a first composition and a second epitaxial layer on the first epitaxial layer, the second epitaxial layer having a second composition. The second epitaxial layer is removed from the source/drain region of the fin to form a gap. The gap is filled with a dielectric material. Another epitaxial material is formed on at least two surfaces of the first epitaxial layer to form a source/drain feature.
109 Citations
20 Claims
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1. A method of semiconductor device fabrication, comprising:
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forming a fin extending from a substrate, the fin having a source/drain region and a channel region, wherein the fin includes a first epitaxial layer having a first composition and a second epitaxial layer on the first epitaxial layer, the second epitaxial layer having a second composition; removing the second epitaxial layer from the source/drain region of the fin to form a gap; filling the gap with a dielectric material; and while the dielectric material is filling the gap, growing another epitaxial material on at least two surfaces of the first epitaxial layer to form a source/drain feature. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10)
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11. A method of fabricating a multi-gate device, the method comprising:
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growing an epitaxial layer stack including first, second, and third epitaxial layers; patterning the epitaxial layer stack to form a fin element; forming a dummy gate structure over the fin element; transforming the second epitaxial layer in a first region and a second region of the fin to a dielectric layer, wherein the first and second regions are interposed by a third region of the fin, wherein the third region underlies the dummy gate structure; removing the dummy gate structure after transforming the second epitaxial layer, thereby forming a trench; and forming a metal gate structure in the trench, wherein the metal gate structure is disposed on multiple sides of each of the first and third epitaxial layers. - View Dependent Claims (12, 13, 14, 15, 16)
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17. A multi-gate semiconductor device, comprising:
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a fin element extending from a substrate; a gate structure extending over a channel region of the fin element, wherein the channel region of the fin element includes a plurality of channel semiconductor layers each surrounded by a portion of the gate structure; and a source/drain region of the fin element adjacent the gate structure, wherein the source/drain region includes; a first semiconductor layer, a dielectric layer over the first semiconductor layer, and a second semiconductor layer over the dielectric layer. - View Dependent Claims (18, 19, 20)
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Specification