• US 20170022391A1
  • Filed: 07/08/2016
  • Published: 01/26/2017
  • Est. Priority Date: 07/23/2015
  • Status: Active Grant
First Claim
Patent Images

1. A polishing slurry composition comprising:

  • at least two types of abrasive particles among first abrasive particles, second abrasive particles, and third abrasive particles; and

    an oxidizer,wherein a peak-to-valley roughness Rpv decreases when a contact area between the abrasive particles and a tungsten-containing film increases.

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