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PHOTOLITHOGRAPHIC PATTERNING OF ORGANIC ELECTRONIC DEVICES

  • US 20170222147A1
  • Filed: 07/31/2015
  • Published: 08/03/2017
  • Est. Priority Date: 08/01/2014
  • Status: Active Grant
First Claim
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1. A method of patterning an organic device comprising:

  • a) depositing a first organic functional layer over a device substrate to form a first intermediate structure, the first organic functional layer having a first function;

    b) processing the first intermediate structure to form a processed first intermediate structure, wherein the processing includes coating a fluoropolymer over the first intermediate structure and subsequent dissolution of the fluoropolymer in a processing agent comprising a fluorinated solvent; and

    c) depositing a second organic functional layer over at least a portion of the first organic functional layer, the second organic functional layer also having the first function.

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