Prism, Prism Production Method, Mold, And Sensor Chip

• US 20170276604A1
• Filed: 09/07/2015
• Published: 09/28/2017
• Est. Priority Date: 09/24/2014
• Status: Active Grant

• Current Assignee: Otsuka Pharmaceutical Company Limited (Otsuka Holdings Company Limited)
• Original Assignee: Konica Minolta Inc.
• Inventors: OKUMURA, Yoshihiro, GOSHIMA, Takehiko, YUASA, Seiji
• Granted Patent: US 11,156,552 B2
• Time in Patent Office: Days
• CPC Class Codes: B29C 2045/0027 Gate or gate mark locations
• CPC Class Codes: B29C 2045/0079 applying a coating or covering
• CPC Class Codes: B29C 33/3828 Moulds made of at least two different materials having different thermal conductivities
• CPC Class Codes: B29C 33/56 Coatings , e.g. enameled or galvanised; Releasing, lubricating or separating agents in-mould coating B29C37/0028; using or applying separating agents B29C37/0067
• CPC Class Codes: B29C 45/0025 Preventing defects on the moulded article, e.g. weld lines, shrinkage marks preventing defects on the preformed parts or layers B29C45/14836
• CPC Class Codes: B29C 45/37 Mould cavity walls , i.e. the inner surface forming the mould cavity, e.g. linings
• CPC Class Codes: B29D 11/0074 Production of other optical elements not provided for in B29D11/00009- B29D11/0073
• CPC Class Codes: B29K 2879/08 PI, i.e. polyimides or derivatives thereof
• CPC Class Codes: B29K 2905/02 Aluminium
• CPC Class Codes: B29K 2905/10 Copper
• CPC Class Codes: B29K 2909/02 Ceramics
• CPC Class Codes: B29K 2995/0013 Conductive
• CPC Class Codes: B29K 2995/0015 Insulating
• CPC Class Codes: B29L 2011/00 Optical elements, e.g. lenses, prisms
• CPC Class Codes: G01N 2021/6439 with indicators, stains, dyes, tags, labels, marks
• CPC Class Codes: G01N 21/41 Refractivity; Phase-affecting properties, e.g. optical path length G01N21/21 takes precedence
• CPC Class Codes: G01N 21/553 and using surface plasmons fluorescence excitation G01N21/648; enhanced Raman G01N21/658
• CPC Class Codes: G01N 21/64 Fluorescence; Phosphorescence
• CPC Class Codes: G01N 21/6428 Measuring fluorescence of fluorescent products of reactions or of fluorochrome labelled reactive substances, e.g. measuring quenching effects, using measuring "optrodes" in vivo A61B5/00; immunoassay G01N33/53
• CPC Class Codes: G01N 21/648 using evanescent coupling or surface plasmon coupling for the excitation of fluorescence
• CPC Class Codes: G01N 33/54373 : involving physiochemical end-point determination, e.g. wave-guides, FETS, gratings
• CPC Class Codes: G02B 5/04 : Prisms

Abstract

A prism (1090) is configured from a dielectric medium and is used in analysis using surface plasmons. The prism (1090) is provided with an incidence surface (1170) on which excitation light from outside is incident, a reflection surface (1172) on which excitation light having entered the incidence surface (1170) is reflected, an emission surface (1174) from which excitation light reflected by the reflection surface (1172) is emitted, and an opposing surface (1175) opposing the reflection surface (1172). A gold film (1092) is formed on the reflection surface (1172). The opposing surface (1175) has a sink-mark surface (1200), and the sink-mark surface (1200) is a transparent surface.

Claims

1. A prism which is constituted by a dielectric medium and is used for an analysis utilizing surface plasmon, comprising:

an incidence surface through which excitation light enters from an outside;

a reflection surface on which the excitation light which has entered through the incidence surface is reflected;

an emission surface through which the excitation light which has been reflected on the reflection surface exits; and

an opposing surface which is opposed to the reflection surface,

wherein a metal film is formed on the reflection surface,

wherein the opposing surface comprises a sink-mark surface, and

wherein the sink-mark surface is transparent.

2. The prism according to claim 1,

wherein the sink-mark surface is a concave surface.

3. The prism according to claim 1,

wherein the sink-mark surface is disposed vertically right below an area including an antigen trapping position of the metal film, and

wherein the size of the sink-mark surface is larger than the size of the area.

4. The prism according to claim 1,

wherein a surface roughness Ra of the sink-mark surface is from 0.1 nm to less than 0.5 μ

m.

5. A method for producing the prism according to claim 1, comprising:

preparing a mold with a certain cavity;

injecting a certain resin to fill the cavity;

applying a dwell pressure to the resin; and

cooling the resin,

wherein the mold comprises a transfer area for forming the sink-mark surface, and

wherein a surface roughness Ra of the transfer area is from 0.1 nm to less than 0.5 μ

m.

6. A method for producing the prism according to claim 1, comprising:

preparing a mold with a certain cavity;

injecting a certain resin to fill the cavity;

applying a dwell pressure to the resin; and

cooling the resin,

wherein the opposing surface of the mold comprises a first transfer area for forming the sink-mark surface and a second transfer area for forming a non-sink-mark surface between the sink-mark surface and the incidence surface or the emission surface,

wherein a surface roughness Ra of the first transfer area is from 0.1 nm to less than 0.5 μ

m, and

wherein a surface roughness Ra of the second transfer area is from 0.5 μ

m to less than 100 μ

m.

7. A mold for producing the prism according to claim 1, comprising:

a transfer area for forming the sink-mark surface,

wherein a surface roughness Ra of the transfer area is from 0.1 nm to less than 0.5 μ

m.

8. A mold for producing the prism according to claim 1, comprising:

a first transfer area for forming the sink-mark surface of the opposing surface and a second transfer area for forming a non-sink-mark surface of the opposing surface between the sink-mark surface and the incidence surface or the emission surface,

wherein a surface roughness Ra of the first transfer area is from 0.1 nm to less than 0.5 μ

m, and

wherein a surface roughness Ra of the second transfer area is from 0.5 μ

m to less than 100 μ

m.

9. A sensor chip, comprising:

the prism according to claim 1; and

a channel forming body in which a channel is formed.