LOW VOLTAGE LASER DIODES ON GALLIUM AND NITROGEN CONTAINING SUBSTRATES
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Accused Products
Abstract
A low voltage laser device having an active region configured for one or more selected wavelengths of light emissions.
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Citations
127 Claims
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1-17. -17. (canceled)
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18. A laser diode device comprising:
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a gallium and nitrogen containing substrate including a {20-21} crystalline surface region orientation; an n-type cladding material overlying the n-type gallium and nitrogen containing material, the n-type cladding material being substantially free from an aluminum bearing material; an active region comprising at least three quantum wells and a plurality of barrier layers, each of the quantum wells having a thickness of 1 nm and greater, and each of the plurality of barrier layers having a thickness ranging from 1 nm to less than 3 nm, each adjacent pair of the quantum wells separated by one of the plurality of barrier layers; a p-type cladding material overlying the active region, the p-type cladding material being free from AlGaN; a p-type material overlying the p-type cladding material a laser stripe region overlying the crystalline surface region, the laser stripe region being aligned substantially in a projection of the c-direction, the laser stripe region comprising a first end and a second end; a first facet formed on the first end; and a second facet formed on the second end. - View Dependent Claims (21, 24, 32, 33, 43, 49, 50, 56)
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19-20. -20. (canceled)
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22-23. -23. (canceled)
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25-31. -31. (canceled)
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34-42. -42. (canceled)
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44-48. -48. (canceled)
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51-55. -55. (canceled)
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57-91. -91. (canceled)
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92. A laser diode device comprising:
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a gallium and nitrogen containing substrate including a {20-21} crystalline surface region orientation; an n-type cladding material overlying the n-type gallium and nitrogen containing material, the n-type cladding material being substantially free from an aluminum bearing material; an active region comprising at least three quantum wells and a plurality of barrier layers, each of the quantum wells having a thickness of 1 nm and greater, and each of the plurality of barrier layers having a p-type characteristic and a thickness ranging from 1 nm to less than 3 nm, each adjacent pair of the quantum wells separated by one of the plurality of barrier layers; a p-type cladding material overlying the active region, the p-type cladding material being substantially free from AlGaN; and a p-type material overlying the p-type cladding material; a laser stripe region overlying the crystalline surface region, the laser stripe region being aligned substantially in a projection of the c-direction, the laser stripe region comprising a first end and a second end; a first facet formed on the first end; and a second facet formed on the second end. - View Dependent Claims (95, 97, 104, 105, 114, 117, 118, 119, 125)
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93-94. -94. (canceled)
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96. (canceled)
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98-103. -103. (canceled)
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106-113. -113. (canceled)
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115-116. -116. (canceled)
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120-124. -124. (canceled)
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126. A laser diode device comprising:
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a gallium and nitrogen containing substrate including a {20-21} crystalline surface region orientation; an n-type cladding material overlying the n-type gallium and nitrogen containing material an active region comprising at least three quantum wells and a plurality of barrier layers, each of the quantum wells having a thickness of 1 nm and greater, and each of the plurality of barrier layers having a thickness ranging from 1 nm to less than 3 nm, each adjacent pair of the quantum wells separated by one of the plurality of barrier layers; a p-type cladding material overlying the active region, the p-type cladding material being free from AlGaN; a p-type material overlying the p-type cladding material; a laser stripe region overlying the crystalline surface region, the laser stripe region being aligned substantially in a projection of the c-direction, the laser stripe region comprising a first end and a second end; a first facet formed on the first end; and a second facet formed on the second end, wherein the active region is configured operably for a forward voltage of less than 7V for an output power of 60 mW and greater.
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127-129. -129. (canceled)
Specification