LOAD LOCK SYSTEM FOR CHARGED PARTICLE BEAM IMAGING

• US 20180240645A1
• Filed: 02/23/2017
• Published: 08/23/2018
• Est. Priority Date: 02/23/2017
• Status: Active Grant

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: Hermes Microvision, Inc. (ASML Holding NV)
• Inventors: HUANG, HSUAN-BIN, LU, CHUN-LIANG, TU, CHIN-FA, LIN, WEN-SHENG, WANG, YOU-JIN
• Granted Patent: US 10,176,967 B2
• Time in Patent Office: Days
• CPC Class Codes: G01B 11/00 Measuring arrangements characterised by the use of optical techniques
• CPC Class Codes: H01J 2237/022 Avoiding or removing foreign or contaminating particles, debris or deposits on sample or tube
• CPC Class Codes: H01J 2237/20292 Means for position and/or orientation registration
• CPC Class Codes: H01J 2237/28 Scanning microscopes
• CPC Class Codes: H01J 37/18 Vacuum locks ; Means for obtaining or maintaining the desired pressure within the vessel vacuum locks for electron-beam tubes in general H01J29/865
• CPC Class Codes: H01J 37/185 Means for transferring objects between different enclosures of different pressure or atmosphere
• CPC Class Codes: H01J 37/20 Means for supporting or positioning the objects or the material; Means for adjusting diaphragms or lenses associated with the support introducing the objects H01J37/18
• CPC Class Codes: H01J 37/261 Details
• CPC Class Codes: H01J 37/28 with scanning beams H01J37/268, H01J37/292, H01J37/2955 take precedence
• CPC Class Codes: H01L 21/67201 characterized by the construction of the load-lock chamber
• CPC Class Codes: H01L 21/67265 of substrates stored in a container, a magazine, a carrier, a boat or the like
• CPC Class Codes: H01L 21/67766 Mechanical parts of transfer devices robots in general in B25J

Abstract

A load lock system for charged particle beam imaging with a particle shielding plate, a bottom seal plate and a plurality of sensor units is provided. The sensor units are located above the wafer, the shield plate is designed to have a few number of screws, and the bottom seal plate contains no cable, no contact sensors and fewer screws used. In the invention, the system is designed to improve the contamination particles from components in the load lock system of charged particle beam inspection tool and also to simplify its assembly.

Claims

1. A seal load lock apparatus for holding a sample, comprising:

a particle shielding plate disposed above a device for holding the sample for shielding from at least one undesired particle from at least one component coupled with the apparatus; and

a bottom plate located below the device for holding the sample,

wherein the particle shielding plate includes a cutout located on an edge of the particle shielding plate.

2. The apparatus of claim 1, further comprising a top seal plate disposed above the device to form a room to seal the sample.

3. The apparatus of claim 2, wherein the particle shielding plate is inside the room and above the device.

4. The apparatus of claim 1, further comprising a position detecting unit with an emitter for projecting a light beam on the sample and a receiver for receiving the reflected signal from the sample to identify a position of the sample,

wherein the position detecting unit is separated from the bottom seal plate,

wherein the position includes at least a vertical position of the sample, and

wherein the cutout corresponds to the position detecting unit.

5. The apparatus of claim 4, further comprising a view port located between the position detecting unit and the device to pass the light beam and a reflected signal from the sample.

6. The apparatus of claim 4, wherein the position detecting unit includes a laser sensor.

7. The apparatus of claim 1, further comprising a position detecting unit, the position detecting unit including a contact sensor positioned on the bottom plate.

8. The apparatus of claim 2, further comprising a position detecting unit to identify a position of the sample, wherein the position detecting unit is positioned external or internal to the room, wherein the position includes at least a vertical position of the sample.

9. The apparatus of claim 8, wherein the position detecting unit includes a contact sensor positioned on the bottom plate.

10. The apparatus of claim 8, wherein the position detecting unit includes an emitter for projecting a light beam on the sample and a receiver for receiving the reflected signal from the sample to identify the position of the sample, the position detecting unit being separated from the bottom plate.

11. The apparatus of claim 10, further comprising a view port located between the position detecting unit and the device to pass the light beam and a reflected signal from the sample.

12. The apparatus of claim 10, wherein the position detecting unit includes a laser sensor.

13. The apparatus of claim 1, wherein the apparatus is configured to be coupled to a load lock system to enable transfer of the sample between the apparatus and a low vacuum environment, wherein the load lock system is configured for use in an inspection tool.

14. The apparatus of claim 1, wherein the load lock apparatus is configured to be installed in a SORIL SEM.

15. A bottom seal load lock apparatus for supporting a sample, comprising:

a plurality of wafer standoffs to support the sample;

a particle shield plate located above the wafer standoffs for shielding from at least one undesired particle from at least one component coupled with the apparatus, wherein the particle shield plate has a plurality of screws to fix the particle shield plate to the apparatus;

a bottom seal plate disposed below the wafer standoffs, wherein the bottom seal plate has a plurality of screws to fix the bottom seal plate to the apparatus for holding the sample; and

a plurality of position detecting units separated from the bottom seal plate for detecting a geometric position of the sample by projecting a light beam on the sample.

16. The apparatus of claim 15, wherein the position detecting units further include a receiver for receiving the reflected signal from the sample, and wherein the particle shield plate includes a plurality of cutouts located on an edge of the particle shield plate corresponding to the position detecting units.

17. The apparatus of claim 15, wherein the position detecting units include a laser sensor.

18. The apparatus of claim 15, further comprising a view port located between the position detecting units and the wafer standoffs to pass the light beam and a reflected signal from the sample.

19. The apparatus of claim 15, wherein the geometric position includes at least a vertical position of the sample.

20. The apparatus of claim 15, further comprising a top seal plate disposed above the wafer standoffs to form a room to seal the sample.

21. The apparatus of claim 15, further comprising a top seal plate disposed above the wafer standoffs to form a room to seal the sample and a view port located between the position detecting units and the wafer standoffs to pass the light beam and a reflected signal from the sample.

22. The apparatus of claim 15, wherein the apparatus is configured to be coupled to a load lock system to enable transfer of the sample between the bottom seal load lock apparatus and a low vacuum environment, wherein the load lock system is configured for use in an inspection tool.

23. The apparatus of claim 15, wherein the apparatus is configured to be installed in a SORIL SEM.

24. An inspection system, comprising:

a charged particle beam emitter for emitting a primary charged particle beam;

a condenser lens for condensing the primary charged particle beam;

an objective lens for focusing the primary charged particle beam to probe a sample;

a plurality of deflection electrodes for scanning the charged particle beam probe across a surface of the sample;

a detector for detecting secondary charged particles generated from the sample surface; and

a bottom seal load lock apparatus, which is coupled to a load lock system to enable transfer of the sample between a vacuum chamber and an atmosphere environment, comprising;

a plurality of wafer standoffs to support the sample;

a particle shield plate located above the wafer standoffs for shielding from at least one undesired particle from at least one component coupled with the apparatus, wherein the particle shield plate has a plurality of screws to fix the particle shield plate to the apparatus;

a bottom seal plate disposed below the wafer standoffs, wherein the bottom seal plate has a plurality of screws to fix the bottom seal plate to the apparatus for holding the sample; and

a plurality of position detecting units separated from the bottom seal plate for detecting a geometric position of the sample by projecting a light beam on the sample.

25. The apparatus of claim 24, further comprising a top seal plate disposed above the wafer standoffs to form a room to seal the sample.

26. A method for shielding components in a charged particle beam inspection tool from contamination particles, comprising:

utilizing a seal room for sealing a sample for inspection by a charged particle beam, wherein a plurality of position detecting units are positioned outside the room for detecting a position of the sample;

utilizing a particle shielding plate disposed in the room with a plurality of screws to fix the particle shielding plate, the particle shielding plate including a plurality of cutouts located on an edge of the particle shielding plate corresponding to the position detecting units; and

utilizing a bottom seal plate disposed in the room for supporting the sample with a plurality of screws for fixing the bottom seal plate.