DEVICES, SYSTEMS, AND METHODS FOR CLEANING VESSELS

• US 20180339318A1
• Filed: 05/25/2018
• Published: 11/29/2018
• Est. Priority Date: 05/25/2017
• Status: Active Grant

• Current Assignee: Ecoserv Technologies, LLC
• Original Assignee: Ecoserv Technologies, LLC
• Inventors: DesOrmeaux, Kenny
• Granted Patent: US 10,632,512 B2
• Time in Patent Office: Days
• CPC Class Codes: B08B 1/12 Brushes
• CPC Class Codes: B08B 1/32 using rotary cleaning members
• CPC Class Codes: B08B 2209/08 Details of machines or methods for cleaning containers, e.g. tanks
• CPC Class Codes: B08B 3/02 Cleaning by the force of jets or sprays
• CPC Class Codes: B08B 3/08 the liquid having chemical or dissolving effect substances used, see the relevant classes
• CPC Class Codes: B08B 5/04 Cleaning by suction, with or without auxiliary action B08B9/035 takes precedence; suction cleaners A47L
• CPC Class Codes: B08B 7/0035 by radiant energy, e.g. UV, laser, light beam or the like
• CPC Class Codes: B08B 7/0042 by laser
• CPC Class Codes: B08B 7/0071 by heating B08B7/0035 takes precedence
• CPC Class Codes: B08B 7/028 Using ultrasounds
• CPC Class Codes: B08B 9/087 by methods involving the use of tools, e.g. brushes, scrapers B08B9/0808 , B08B9/20 take precedence
• CPC Class Codes: B08B 9/0933 Removing sludge or the like from tank bottoms
• CPC Class Codes: B08B 9/0936 using rotating jets
• CPC Class Codes: G01S 17/10 using transmission of interrupted, pulse-modulated waves determination of distance by phase measurements G01S17/32

Abstract

A cleaning system includes a cleaning apparatus that is positionable in a cleaning environment and a cleaning processing device. The cleaning apparatus includes a sensor and a cleaning device. The sensor is configured to measure a depth of a target material on a surface of the vessel, and the cleaning device is configured to generate a cleaning force. The cleaning processing device is configured to receive a plurality of depth measurements of the target material on the surface, determine a cleaning protocol for the cleaning device on the surface based on the plurality of depth measurements, and control the cleaning apparatus to cause the cleaning device to apply the cleaning force to the surface pursuant to the cleaning protocol.

Claims

1. A method of cleaning a vessel having a size and a shape and defining a cleaning environment, wherein the vessel comprises a surface having a target material on the surface to be cleaned, the method comprising:

positioning a cleaning apparatus in the cleaning environment of the vessel, wherein the cleaning apparatus comprises a sensor and a cleaning device, wherein the cleaning device generates a cleaning force;

measuring, with the sensor, a plurality of depth measurements of the target material to be cleaned from the surface;

communicating the plurality of depth measurements to a cleaning processing device;

determining, by the cleaning processing device and based at least in part on the plurality of depth measurements, a cleaning protocol for the cleaning device to perform; and

controlling, by the cleaning processing device, the cleaning apparatus by causing the cleaning device to apply the cleaning force to the surface pursuant to the cleaning protocol.

2. The method of claim 1, further comprising determining a type of cleaning force of the cleaning device, wherein determining the cleaning protocol further comprises determining the cleaning protocol at least partially based on the type of cleaning force.

3. The method of claim 1, wherein the cleaning apparatus comprises a track-mounted base that is movable along the surface, and wherein controlling the cleaning apparatus comprises moving the cleaning apparatus along the surface while causing the cleaning device to apply the cleaning force.

4. The method of claim 3, wherein the cleaning apparatus comprises an arm on the base and supporting the cleaning device, wherein the arm comprises:

a first rotatable arm member defining a first axis, wherein the first rotatable arm member is rotatable about the first axis; and

a second rotatable arm member defining a second axis and connected to the first rotatable arm member, wherein the second rotatable arm member is rotatable about the second axis, and

wherein controlling the cleaning apparatus comprises controlling an orientation of the cleaning device by moving at least one of the first rotatable arm member or the second rotatable arm member while causing the cleaning device to provide the cleaning force.

5. The method of claim 1, wherein the cleaning apparatus comprises a base and an arm on the base supporting the cleaning device, wherein the arm comprises:

a first rotatable arm member defining a first axis, wherein the first rotatable arm member is rotatable about the first axis; and

a second rotatable arm member defining a second axis and connected to the first rotatable arm member, wherein the second rotatable arm member is rotatable about the second axis, and

wherein controlling the cleaning apparatus comprises maintaining a position of the base relative to the surface and controlling an orientation of the cleaning device by moving at least one of the first rotatable arm member or the second rotatable arm member while causing the cleaning device to provide the cleaning force.

6. The method of claim 1, wherein determining the cleaning protocol further comprises determining the cleaning protocol at least partially based on the size and/or shape of the vessel.

7. The method of claim 1, further comprising:

removing from the cleaning environment the target material cleaned from the surface by the cleaning apparatus;

measuring, by the sensor, a dimension of the cleaning environment;

comparing, by the cleaning processing device, the measured dimension to a predefined dimension;

providing an integrity alert based on the measured dimension being greater than the predefined dimension;

measuring with the sensor a second plurality of depth measurements along the surface based on the measured dimension being less than the predefined dimension;

determining, by the cleaning processing device, a second cleaning protocol for the cleaning device on the surface based on the second plurality of depth measurements; and

controlling, by the cleaning processing device, the cleaning apparatus by causing the cleaning device provide the cleaning force to the surface pursuant to the second cleaning protocol.

8. The method of claim 1, wherein the sensor is a LIDAR sensor.

9. The method of claim 1, wherein determining the cleaning protocol comprises determining a cleaning time for locations on the surface and a cleaning orientation of the cleaning device relative to the respective locations during the respective cleaning times, wherein controlling the cleaning apparatus comprises causing the cleaning device to provide, at each location, the cleaning force for the cleaning time at the cleaning orientation for that location.

10. The method of claim 1, further comprising causing the cleaning apparatus to clean the surface pursuant to an initial cleaning protocol before measuring the plurality of depth measurements.

11. A cleaning system for cleaning a vessel having a size and an shape and defining a cleaning environment, wherein the vessel comprises a surface having a target material on the surface to be cleaned, the cleaning system comprising:

a cleaning apparatus positionable in the cleaning environment of the vessel, the cleaning apparatus comprising;

a sensor configured to measure a depth of the target material on the surface of the vessel; and

a cleaning device, wherein the cleaning device is configured to generate a cleaning force; and

a cleaning processing device, wherein the cleaning processing device is configured to receive from the sensor a plurality of depth measurements of the target material on the surface, determine a cleaning protocol for the cleaning device based at least in part on the plurality of depth measurements, and control the cleaning apparatus to cause the cleaning device to apply the cleaning force to the surface pursuant to the cleaning protocol.

12. The cleaning system of claim 11, wherein the cleaning apparatus comprises a track-mounted base that is movable along the surface, and wherein the cleaning processing device is configured to move the cleaning apparatus along the surface while causing the cleaning device to provide the cleaning force.

13. The cleaning system of claim 12, wherein the cleaning apparatus comprises an arm on the base and supporting the cleaning device, wherein the arm comprises:

a first rotatable arm member defining a first axis, wherein the first rotatable arm member is rotatable about the first axis; and

a second rotatable arm member defining a second axis and connected to the first rotatable arm member, wherein the second rotatable arm member is rotatable about the second axis, and

wherein the cleaning processing device is configured to move at least one of the first rotatable arm member or the second rotatable arm member while causing the cleaning device to provide the cleaning force.

14. The cleaning system of claim 11, wherein the cleaning apparatus comprises a base and an arm on the base supporting the cleaning device, wherein the arm comprises:

a first rotatable arm member defining a first axis, wherein the first rotatable arm member is rotatable about the first axis; and

a second rotatable arm member defining a second axis and connected to the first rotatable arm member, wherein the second rotatable arm member is rotatable about the second axis, and

wherein the cleaning processing device is configured to maintain a position of the base relative to the surface and move at least one of the first rotatable arm member or the second rotatable arm member while causing the cleaning device to provide the cleaning force.

15. The cleaning system of claim 11, wherein the cleaning processing device is on the cleaning apparatus.

16. The cleaning system of claim 11, wherein the cleaning device comprises a nozzle configured to emit at least one of heat, a fluid, a high-intensity light, acoustic waves, or sonic waves as the cleaning force.

17. The cleaning system of claim 11, wherein the cleaning apparatus further comprises a removal device configured to remove the target material.

18. The cleaning system of claim 11, wherein the sensor is a LIDAR sensor.

19. The cleaning system of claim 11, wherein the cleaning protocol comprises at least one of path of movement of the cleaning device within the cleaning environment, speed of movement of the cleaning device within the cleaning environment, duration and/or strength of the cleaning force on a particular location on the surface, and orientation of the cleaning apparatus relative to the particular location on the surface.

20. The cleaning system of claim 11, wherein the cleaning processing device is configured to determine the cleaning protocol for the cleaning device based further on at least one of the size and/or shape of the vessel and the type of cleaning force of the cleaning of the cleaning device.