OLED ARRAY SUBSTRATE, MANUFACTURING METHOD THEREOF, OLED DISPLAY PANEL AND OLED DISPLAY DEVICE

• US 20180358578A1
• Filed: 01/12/2017
• Published: 12/13/2018
• Est. Priority Date: 01/15/2016
• Status: Active Grant

• Current Assignee: BOE Technology Group Co., Ltd.
• Original Assignee: BOE Technology Group Co., Ltd.
• Inventors: LI, Wei, SONG, Youngsuk, ZHANG, Jianye
• Granted Patent: US 10,727,446 B2
• Time in Patent Office: Days
• CPC Class Codes: H01L 21/77 Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate electrically programmable read-only memories or multistep manufacturing processes therefor H10B69/00
• CPC Class Codes: H10K 50/844 Encapsulations
• CPC Class Codes: H10K 50/852 comprising a resonant cavity structure, e.g. Bragg reflector pair
• CPC Class Codes: H10K 50/856 comprising reflective means
• CPC Class Codes: H10K 59/1201 Manufacture or treatment
• CPC Class Codes: H10K 59/122 Pixel-defining structures or layers, e.g. banks
• CPC Class Codes: H10K 59/38 comprising colour filters or colour changing media [CCM]
• CPC Class Codes: H10K 71/00 Manufacture or treatment specially adapted for the organic devices covered by this subclass
• CPC Class Codes: H10K 71/12 using liquid deposition, e.g. spin coating
• CPC Class Codes: Y02E 10/549 Organic PV cells
• CPC Class Codes: Y02P 70/50 Manufacturing or production processes characterised by the final manufactured product

Abstract

The present disclosure provides an OLED array substrate comprising a plurality of pixel units each including a plurality of sub-pixel units, each of the sub-pixel units comprising a light-emitting portion, each light-emitting portion having a first electrode, a second electrode and an organic light-emitting layer sandwiched between the first electrode and the second electrode, wherein the sub-pixel unit further comprises an organic film layer and a semi-reflecting mirror layer disposed successively on a light exit side of the second electrode, the first electrode comprises a reflective layer, the second electrode is a transparent electrode, a structure between the first electrode and the semi-reflecting mirror layer constitutes a microcavity structure, and organic film layers of the sub-pixel units of different colors of each pixel unit have different thicknesses. The present disclosure further provides an OLED display panel, an OLED display device, and a method of manufacturing the array substrate.

Claims

1. An OLED array substrate comprising a plurality of pixel units each including a plurality of sub-pixel units, each of the sub-pixel units comprising a light-emitting portion, each light-emitting portion having a first electrode remote from a light exit side, a second electrode close to the light exit side and an organic light-emitting layer sandwiched between the first electrode and the second electrode, wherein the sub-pixel unit further comprises an organic film layer and a semi-reflecting mirror layer disposed successively on a light exit side of the second electrode, the first electrode comprises a reflective layer, the second electrode is a transparent electrode, a structure between the first electrode and the semi-reflecting mirror layer constitutes a microcavity structure, and organic film layers of the sub-pixel units of different colors of each pixel unit have different thicknesses.

2. The OLED array substrate according to claim 1, wherein the thickness of the organic film layer is designed according to an effective cavity length of the microcavity structure, a full width at half maximum of an emission peak and the Fabry-Perot formula,

wherein

the effective cavity length L(λ

) of the microcavity structure is calculated by the following formula;

3. The OLED array substrate according to claim 1, wherein the sub-pixel unit further comprises a color film layer disposed on a light exit side of the semi-reflecting mirror layer, and color film layers of the sub-pixel units of different colors of the pixel unit have different colors.

4. The OLED array substrate according to claim 1, wherein the organic film layer is formed of a low-temperature curing material, and the low-temperature curing material has a curing temperature of not higher than about 100°

C.

5. The OLED array substrate according to claim 4, wherein the low-temperature curing material includes one or more of an epoxy resin, an acrylic resin, a phenol resin, and a polyurethane.

6. The OLED array substrate according to claim 1, wherein the semi-reflecting mirror layer has a thickness of about 100 to 150 nm.

7. The OLED array substrate according to claim 1, wherein the semi-reflecting mirror layer is a metal layer in which a plurality of holes are regularly arranged.

8. The OLED array substrate according to claim 1, wherein the first electrode has a thickness of about 90 to 100 nm.

9. The OLED array substrate according to claim 1, wherein the second electrode has a thickness of about 100 to 150 nm.

10. The OLED array substrate according to claim 1, wherein the sub-pixel unit further comprises an encapsulation layer disposed between the second electrode and the organic film layer, the encapsulation layer having a thickness of about 3.0 to 3.5 μ

m, and the microcavity structure further comprising the encapsulation layer.

11. The OLED array substrate according to claim 1, further comprising a pixel definition layer disposed between the first electrode and the organic light-emitting layer of each of the sub-pixel units, wherein the pixel definition layer has a thickness of about 1.0 to 1.5 μ

m.

12. The OLED array substrate according to claim 1, wherein the organic light-emitting layer has a thickness of about 200 to 300 nm.

13. The OLED array substrate according to claim 3, further comprising a secondary encapsulation layer disposed on a light exit side of the color film layer of each of the sub-pixel units, the secondary encapsulation layer having a thickness of about 3.0 to 3.5 μ

m.

14. The OLED array substrate according to claim 13, wherein the secondary encapsulation layer includes an acrylate-based adhesive and a glass cover.

15. An OLED display panel comprising the OLED array substrate according to claim 1.

20. The OLED display panel according to claim 15, wherein the thickness of the organic film layer is designed according to an effective cavity length of the microcavity structure, a full width at half maximum of an emission peak and the Fabry-Perot formula,

wherein

the effective cavity length L(λ

) of the microcavity structure is calculated by the following formula;

21. The OLED display panel according to claim 15, wherein the sub-pixel unit further comprises a color film layer disposed on a light exit side of the semi-reflecting mirror layer, and color film layers of the sub-pixel units of different colors of the pixel unit have different colors.

16. (canceled)

17. A manufacturing method of an OLED array substrate comprising a plurality of pixel units each including a plurality of sub-pixel units;

the manufacturing method comprising;

successively forming, on a base substrate, a first electrode, an organic light-emitting layer, a second electrode, an organic film layer and a semi-reflecting mirror layer corresponding to each sub-pixel unit along a light exit direction of the OLED array substrate,

wherein the first electrode comprises a reflective layer, the second electrode is a transparent electrode, a structure between the first electrode and the semi-reflecting mirror layer constitutes a microcavity structure, and organic film layers of the sub-pixel units of different colors of each pixel unit have different thicknesses.

18. The manufacturing method according to claim 17, wherein the organic film layer of each of the sub-pixel units is integrally formed by steps of:

spin coating a low-temperature curing organic material;

forming an organic film layer with non-uniform thickness by exposure and development using a half-tone mask.

19. The method according to claim 18, wherein during the steps of forming the organic film layer, a process temperature is less than about 100°

C.