SUBSTRATE SUPPORT WITH MULTIPLE EMBEDDED ELECTRODES
First Claim
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1. A substrate support assembly, comprising:
- a plurality of first electrodes within a substrate support, each electrode of the plurality of first electrodes electrically isolated from, and coplanar with, every other electrode of the plurality of first electrodes, wherein each electrode of the plurality of first electrodes is configured to provide a pulsed DC power to a region of a substrate through capacitive coupling therewith; and
a second electrode disposed within the substrate support, and electrically isolated from the plurality of first electrodes, for electrically clamping the substrate to the substrate support.
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Abstract
A method and apparatus for biasing regions of a substrate in a plasma assisted processing chamber are provided. Biasing of the substrate, or regions thereof, increases the potential difference between the substrate and a plasma formed in the processing chamber thereby accelerating ions from the plasma towards the active surfaces of the substrate regions. A plurality of bias electrodes herein are spatially arranged across the substrate support in a pattern that is advantageous for managing uniformity of processing results across the substrate.
14 Citations
25 Claims
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1. A substrate support assembly, comprising:
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a plurality of first electrodes within a substrate support, each electrode of the plurality of first electrodes electrically isolated from, and coplanar with, every other electrode of the plurality of first electrodes, wherein each electrode of the plurality of first electrodes is configured to provide a pulsed DC power to a region of a substrate through capacitive coupling therewith; and a second electrode disposed within the substrate support, and electrically isolated from the plurality of first electrodes, for electrically clamping the substrate to the substrate support. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8)
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9. A processing chamber, comprising:
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one or more sidewalls and a bottom defining a processing volume; and a substrate support, comprising; a plurality of first electrodes within the substrate support, each electrode of the plurality of first electrodes electrically isolated from, and coplanar with, every other electrode of the plurality of first electrodes, wherein each electrode of the plurality of first electrodes is configured to provide a pulsed DC bias to a region of a substrate through capacitive coupling therewith; and a second electrode disposed within the substrate support, and electrically isolated from the plurality of first electrodes, for electrically clamping the substrate to the substrate support. - View Dependent Claims (10, 11, 12, 13, 14)
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15-20. -20. (canceled)
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21. A substrate processing system, comprising:
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a substrate support formed of a dielectric material; an ESC electrode disposed in the substrate support; a plurality of spatially arranged bias electrodes disposed in the substrate support, wherein each of the spatially arranged bias electrodes and the ESC electrode are electrically isolated from each other by the dielectric material of the substrate support disposed therebetween; and electrically isolated from each other by the dielectric material of the substrate support disposed therebetween; and a DC power supply switching system comprising a plurality of first solid state switches to be coupled to a first DC power source and a plurality of second solid state switches to be coupled to a second DC power source, wherein each of bias electrodes is electrically coupled to one of the plurality of first solid state switches and to one of the plurality of second solid state switches. - View Dependent Claims (22, 23, 24, 25)
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Specification