ETCHING SUBSTRATES USING ALE AND SELECTIVE DEPOSITION
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Abstract
Methods of and apparatuses for processing substrates having carbon-containing material using atomic layer etch and selective deposition are provided. Methods involve exposing a carbon-containing material on a substrate to an oxidant and igniting a first plasma to modify a surface of the substrate and exposing the modified surface to a second plasma at a bias power to remove the modified surface. Methods also involve selectively depositing a second carbon-containing material onto the substrate using a precursor having a chemical formula of CxHy, where x and y are integers greater than or equal to 1. ALE and selective deposition may be performed without breaking vacuum.
11 Citations
46 Claims
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1-26. -26. (canceled)
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27. A method of processing substrates, the method comprising:
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(a) exposing a substrate comprising a first carbon-containing material to an oxidant and igniting a first plasma to modify a surface of the first carbon-containing material; and (b) exposing the modified surface to a second plasma at a bias power and for a duration sufficient to remove the modified surface without sputtering. - View Dependent Claims (28, 29, 30, 31, 32, 33, 34, 35, 36, 37, 38, 39, 40, 41, 42, 43, 44)
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45. A method of processing substrates, the method comprising:
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(a) exposing a substrate comprising a first carbon-containing material to an oxidant and igniting a first plasma to modify a surface of the first carbon-containing material; (b) exposing the modified surface to a second plasma at a bias power and for a duration sufficient to remove the modified surface without sputtering; and (c) selectively depositing a second carbon-containing material on the substrate to fill crevices on the first carbon-containing material using a precursor having a chemical formula of CxHy, where x and y are integers greater than or equal to 1. - View Dependent Claims (46)
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Specification