RADIATION SENSITIVE MATERIALS CONTAINING BIPYRIDILIUM SALT OF A STRONG ACID

• US 3,697,528 A
• Filed: 05/26/1970
• Issued: 10/10/1972
• Est. Priority Date: 05/28/1969
• Status: Expired due to Term

• Current Assignee: Glyn David Short, Ieuan Thomas, Timothy Douglas Andrews
• Original Assignee: Glyn David Short, Ieuan Thomas, Timothy Douglas Andrews
• Inventors: Andrews, Timothy Douglas, Short, Glyn David, Thomas, Ieuan
• Primary Examiner(s): Rotman, Alan L.
• Application Number:
  US05/040,714
• Time in Patent Office: 868 Days
• Field of Search: 260/294.9,294.8R
• US Class Current: 546/258
• CPC Class Codes: C07D 213/06 containing only hydrogen and carbon atoms in addition to the ring nitrogen atom
• CPC Class Codes: C07D 213/22 containing two or more pyridine rings directly linked together, e.g. bipyridyl
• CPC Class Codes: C08G 73/0627 with only one nitrogen atom in the ring
• CPC Class Codes: G03C 1/73 containing organic compounds
• CPC Class Codes: G03C 1/733 with macromolecular compounds as photosensitive substances, e.g. photochromic photodegradable or photocrosslinkable compositions G03F7/004

Abstract

A radiation sensitive material based on nitrogeneous dications such as bipyridyls, preferably with a water soluble polymer as a support. Sensitisers and desensitisers are described. The materials are sensitive to X-rays, electrons and UV up to about 500 nm, in the presence of sensitisers.

Claims

2. N,N'"'"''"'"'-bis (p-cyanophenyl) bipyridilium chloride.