Beam type transducers employing accurate, integral force limiting

• US 3,970,982 A
• Filed: 07/07/1975
• Issued: 07/20/1976
• Est. Priority Date: 07/07/1975
• Status: Expired due to Term

• Current Assignee: Kulite Semiconductor Products Inc
• Original Assignee: Kulite Semiconductor Products Inc
• Inventors: Kurtz, Anthony D., Brosh, Amnon, Mallon, Joseph R., Bice, James William
• Primary Examiner(s): Albritton, C. L.
• Application Number:
  US05/593,631
• Time in Patent Office: 379 Days
• Field of Search: 338/4, 338/5, 338/36, 338/42, 338/47, 73/141 A, 73/398 AR, 73/88.5 SD
• US Class Current: 338/4
• CPC Class Codes: G01L 1/2206 Special supports with preselected places to mount the resistance strain gauges; Mounting of supports

Abstract

A beam transducer of the type activated by a push rod secured to a thin silicon diaphragm including a shallow deflection area determining depression. The rod is secured to the silicon within the depression and is surrounded by a plate of glass having a central rod accommodating aperture and secured to the silicon to generally cover the depression with the rod extending through the aperture in the glass. One end of the rod is coupled to a diffused beam for application of force thereto. Large forces as applied to the diaphragm and hence, the rod and the beam are limited when the silicon is caused to contact the glass plate and is stopped by the plate and according to the depth of the depression.

Claims

1. In a beam type transducer of the type employing a deflectable beam having positioned on a surface thereof, at least one force responsive element, in combination therewith means for transmitting a force to said beam employing means for accurately stopping said beam for all forces in excess of a predetermined force, comprising:

a. a silicon member having a central shallow depression on a surface thereof, said depression being of a predetermined depth selected according to said predetermined force,

b. a glass cover member having a central aperture of a given dimension coupled to said silicon member to cover said depression,

c. a rod having one end coupled to said silicon member within said depression and extending through said central aperture in said glass with said other end coupled to said beam for deflecting the same upon application of a force to said silcon member, such that all forces in excess of said predetermined force cause said silicon member to impinge upon said glass and thus stopping said silicon member and said rod coupled thereto according to the depth of said depression.

2. The transducer according to claim 1 wherein said silicon member has an "H" shaped cross section with a first depression of a given depth on a top surface and said shallow depression colinear with said first depression and located on a bottom surface, the area between said top and bottom depression forming a deflectable diaphragm defined by the center arm of said "H" shaped cross section.

3. The transducer according to claim 1 wherein said depression is between 1/10 and several mils and is formed by a chemical etching process.

4. The transducer according to claim 1 wherein said rod is fabricated from an insulator and is bonded to said silicon member relatively centrally within said shallow depression.

5. The transducer according to claim 1 further including a rod accommodating annular boss coupled to said silicon member and positioned relatively centrally thereto in alignment with said central aperture of said glass cover member, said boss having an aperture for accommodating said rod.

6. The transducer according to claim 2 further including a central boss located within said bottom shallow depression on said bottom surface, said boss having an aperture for accommodating said rod.

7. The transducer according to claim 1 wherein said beam is fabricated from a semiconductor and has at least one piezoresistor diffused on a surface thereof.

8. Apparatus for activating a beam type transducer of the type comprising a relatively thin, clamped beam having located on a surface thereof, a force responsive element, said beam having an area for application of a force thereto to cause a proportional variation in a characteristic of said element, comprising:

a. a semiconductor member having a shallow depression on a first surface thereof, said depression having a depth determined by the magnitude of a given force to be applied to said beam,

b. a rod coupled to said member and positioned within said depression and extending from said semiconductor member in a direction relatively perpendicular to said first surface,

c. a glass sheet having an aperture, said glass sheet coupled to said semiconductor member at said first surface with said rod extending therethrough and serving as a barrier to prevent said semiconductor member from deflecting beyond said glass position of said glass for forces applied to said semiconductor having a component to cause said rod to move relatively parallel to its axis, and

d. means coupling the other end of said rod to said area of said beam.

9. The apparatus according to claim 8 wherein said semiconductor member further includes a second shallow depression on the opposite surface and relatively coaxial with said shallow depression on said first surface, and a second glass plate having a central aperture coupled to said opposite surface of said semiconductor to cover said second depression to cause a force applied to said first surface of a predetermined magnitude to cause said silicon member to impinge upon said second glass layer.

10. In combination:

a. a cylindrical housing having a central hollow, being symmetrical about a longitudinal axis,

b. a cantilever beam havng a first end affixed to a portion of said housing and a second deflectable end positioned relatively transverse to said axis,

c. a force transmitting member coupled to said deflectable end of said beam,

d. a rod having a first end coupled to said force transmitting member for activating the same in response to an applied force and positioned relatively parallel to said axis,

e. a glass plate having a central rod accommodating aperture and secured to said housing at a first end with said rod postioned through said aperture,

f. a silicon member bonded to said glass plate and having a shallow depression larger than said aperture in said glass and of a depth selected according to a predetermined force to be applied to said rod, said other end of said rod coupled to said silicon member within said depression, whereby a force applied to said member is transmitted to said rod and hence, to said beam, with said depression capable of coacting with said glass plate to limit said deflection due to said force according to the depth of said depression.

11. The combination according to claim 10 wherein said cylindrical housing is fabricated from glass.

12. The combination according to claim 10 wherein said force transmitting member comprises a "C" shaped flexible member having one arm of said C rigidly secured to said deflectable end of said beam and said other arm coacting with said first end of said rod.

13. The combination according to claim 10 wherein said cantilever beam is a diffused beam having located on a surface thereof, at least one piezoresistive element.

14. The combination according to claim 10 wherein said silicon member further includes an annular ridge on a surface opposite to that surface containing said shallow depression.

15. The combination according to claim 10 further including a central annular boss located within said shallow depression on said silicon member and dimensioned to accommodate and surround said other end of said rod.

16. The combination according to claim 11 wherein said cylindrical housing includes a first cylindrical portion, said first portion coupled to said glass plate to surround said rod.

17. The combination according to claim 16 further including a "U" shaped stop member having first and second arms coupled to opposite ends of said first cylindrical portion of said housing, with the central arm of said U positioned beneath said beam to further limit deflection of said beam due to larger forces than that of those limiting said deflection.

18. The combination according to claim 10 further comprising an annular boss located on a surface opposite to that surface containing said shallow depression, said boss located relatively central on said surface and of a diameter greater than said central rod accomodating aperture.