Method for production of rotationally symmetric non-spherical optical elements

• US 4,032,343 A
• Filed: 02/13/1974
• Issued: 06/28/1977
• Est. Priority Date: 02/14/1973
• Status: Expired due to Term

• Current Assignee: Agfa-Gevaert AG (Agfa-Gevaert N.V.)
• Original Assignee: Agfa-Gevaert AG (Agfa-Gevaert N.V.)
• Inventors: Greis, Ulrich, Deml, Reinhold, Kapfhammer, Wilhelm
• Primary Examiner(s): Kimlin, Edward C.
• Application Number:
  US05/442,140
• Time in Patent Office: 1,231 Days
• Field of Search: 96/38.3, 96/116, 355/2, 354/4
• US Class Current: 430/397
• CPC Class Codes: G02B 5/1857 using exposure or etching means, e.g. holography, photolithography, exposure to electron or ion beams
• CPC Class Codes: G02B 5/32 Holograms used as optical elements
• CPC Class Codes: G03F 7/70075 Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
• CPC Class Codes: G03F 7/70366 Rotary scanning
• CPC Class Codes: G03F 7/70408 Interferometric lithography; Holographic lithography; Self-imaging lithography, e.g. utilizing the Talbot effect

Abstract

A method and arrangement for the production of a rotationally symmetric, non-spherical optical element, in which one or more light beams are directed at a rotating light-sensitive medium, and a fixed opaque shield is situated over the light-sensitive medium to block a portion of the light beams from exposing the medium.

Claims

1. A method of producing a rotationally symmetric non-sherical optical element, comprising the steps of rotating a planar, light-sensitive medium in its plane about an axis which extends normal to said plane;

providing a source of coherent light;

disposing intermediate said source and a major surface of said medium a stationary opaque shield having an opening extending radially from said axis of rotation towards a periphery of said major surface; and

directing at least two beams of light from said source towards said surface in such a manner that said beams intersect and form an interference pattern, portions of said pattern being intercepted by said shield and the remaining portion exposing said medium in form of a rotationally symmetric two-dimensional pattern.

2. A method of producing a rotationally symmetric non-spherical optical element, comprising the steps of rotating a planar, light-sensitive medium in its plane about an axis which extends normal to said plane;

directing a beam of light from a source towards a major surface of said planar medium which is bounded by a periphery thereof;

disposing intermediate said source and said surface a stationary opaque shield having an opening extending radially from said axis of rotation towards said periphery;

interposing between said source and said shield a masking element having regions of different light transmissivity and utilizing the same for varying the light intensity along the length of said opening, said shield and said masking element cooperating with one another to intercept a portion of said light beam so that the remaining portion of said light beam exposes said medium in form of a rotationally symmetric two-dimensional pattern and forms in said light-sensitive medium a permanent image corresponding to said rotationally symmetric pattern and to the light intensity that reaches and affects said light-sensitive medium.

3. Method as defined in claim 2, wherein said opening begins at said axis.

4. Method as defined in claim 3, wherein said opening of said shield is sector-shaped, said opening extends from said axis to the medium-circumference and the apex of said sector is at said axis.

5. Method as defined in claim 3, wherein said opening has a uniform width, and further comprising the step of placing a filter in said opening, said filter having a light transmissivity increasing in a radial direction from said axis.

6. Method as defined in claim 2, further comprising the step of focussing said light beam on said exposure region by a cylindrical optical system.

7. Method as defined in claim 2, wherein said masking element is a grid of constant period.