Deposition method for coating glass and the like
First Claim
1. A process for continuous coating of a substrate with a film formed of reactive components of a gas mixture in which properties of the film vary continuously through the thickness of said film, said process comprising the steps of(a) flowing said gas mixture through a flow path defined by a reaction zone for said reactive components, said reaction zone contiguous to and bounded by a surface of the substrate to be coated,(b) moving said substrate surface through said reaction zone in a direction parallel to said flowing gas mixture,(c) depositing, preferentially, a reaction product derived from more reactive components of said mixture on said surface of said substrate exposed earlier to said gas mixture, thereby preferentially depleting said mixture of said more reactive components,(d) depositing, preferentially, a reaction product derived from less reactive components of said mixture on said surface of said substrate exposed later to said depleted gas mixture, thus(e) providing a product in which properties of said film vary continuously in the composition through the thickness of said film, as said substrate emerges from said reaction zone.
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Abstract
This disclosure describes transparent glass window structures of the type bearing a first coating of infra-red reflective material which is advantageously less than about 0.85 microns in thickness and wherein the observance of iridescence resulting from such a first coating is markedly reduced by provision of a layer of continuously varying refractive index between the glass and the coating, such that the refractive index increases continuously from the glass to the first coating, thereby preventing the observation of iridescence. The invention also encompasses simple processes for providing such windows. A particular advantage of the invention is its efficacy with clear and lightly tinted glasses wherein the problem of iridescent color has had its greatest commercial impact.
78 Citations
20 Claims
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1. A process for continuous coating of a substrate with a film formed of reactive components of a gas mixture in which properties of the film vary continuously through the thickness of said film, said process comprising the steps of
(a) flowing said gas mixture through a flow path defined by a reaction zone for said reactive components, said reaction zone contiguous to and bounded by a surface of the substrate to be coated, (b) moving said substrate surface through said reaction zone in a direction parallel to said flowing gas mixture, (c) depositing, preferentially, a reaction product derived from more reactive components of said mixture on said surface of said substrate exposed earlier to said gas mixture, thereby preferentially depleting said mixture of said more reactive components, (d) depositing, preferentially, a reaction product derived from less reactive components of said mixture on said surface of said substrate exposed later to said depleted gas mixture, thus (e) providing a product in which properties of said film vary continuously in the composition through the thickness of said film, as said substrate emerges from said reaction zone.
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17. A process for forming, on a substrate, a thin coating which has a progressively changing composition from a predominantly first coating composition nearer the substrate to a predominantly second coating composition more remote from the substrate, said process comprising the steps of
(1) introducing into a first end of a reactant chamber and out the other end of said chamber a mixture of (a) a first reactant gas from which said first coating is formed, (b) a second reactant gas from which said second coating compound is formed, and (c) a third gas which forms means to react with each of said first and second reactant gases to form said coating compounds, wherein said first reactant gas reacts at a substantially different rate with said third gas, than does said second reactant gas, the different rates of reaction with said third gas forming means to provide a difference in relative concentration of said reactant gases over the substrate as the thin coating is formed and to provide a changing ratio of said first and second coating compounds in said thin coating as said thin coating is formed on said substrate, (2) said introduction of gases being carried out while continuously passing a substrate to be coated through said reaction chamber from said first end of the chamber to said other end of the chamber.
Specification