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Deposition method for coating glass and the like

  • US 4,206,252 A
  • Filed: 03/08/1978
  • Issued: 06/03/1980
  • Est. Priority Date: 04/04/1977
  • Status: Expired due to Term
First Claim
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1. A process for continuous coating of a substrate with a film formed of reactive components of a gas mixture in which properties of the film vary continuously through the thickness of said film, said process comprising the steps of(a) flowing said gas mixture through a flow path defined by a reaction zone for said reactive components, said reaction zone contiguous to and bounded by a surface of the substrate to be coated,(b) moving said substrate surface through said reaction zone in a direction parallel to said flowing gas mixture,(c) depositing, preferentially, a reaction product derived from more reactive components of said mixture on said surface of said substrate exposed earlier to said gas mixture, thereby preferentially depleting said mixture of said more reactive components,(d) depositing, preferentially, a reaction product derived from less reactive components of said mixture on said surface of said substrate exposed later to said depleted gas mixture, thus(e) providing a product in which properties of said film vary continuously in the composition through the thickness of said film, as said substrate emerges from said reaction zone.

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