Fabrication of optical preforms by axial chemical vapor deposition

• US 4,440,558 A
• Filed: 06/14/1982
• Issued: 04/03/1984
• Est. Priority Date: 06/14/1982
• Status: Expired due to Term

• Current Assignee: Alcatel SA (Nokia Corporation)
• Original Assignee: International Telephone and Telegraph Corporation
• Inventors: Pureza, Pablo C., Nath, Dilip K., Oh, Shin M.
• Primary Examiner(s): Fisher, Richard V.
• Application Number:
  US06/387,983
• Time in Patent Office: 659 Days
• Field of Search: 65/3.12, 65/18.2, 65/32, 65/144, 65/157, 65/13, 427/34, 427/38, 427/163, 427/167, 118/723
• US Class Current: 65/391
• CPC Class Codes: C03B 2201/08 doped with boron or fluorine or other refractive index decreasing dopant
• CPC Class Codes: C03B 2201/28 doped with phosphorus
• CPC Class Codes: C03B 2201/31 doped with germanium
• CPC Class Codes: C03B 2201/40 doped with transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn
• CPC Class Codes: C03B 2201/42 doped with titanium
• CPC Class Codes: C03B 37/01426 Plasma deposition burners or torches
• CPC Class Codes: Y10S 65/16 Optical filament or fiber treatment with fluorine or incorporating fluorine in final product

Abstract

Hydroxyl free deposition with high efficiency and at a high deposition rate may be achieved, even with use of relatively inexpensive raw materials, by utilizing a ring-shaped plasma activated axial chemical vapor deposition obtaining 100% chemical conversion and fractional volatilization of impurities. The plasma is induced in an annular stream of a plasma-forming gaseous medium, and the reactant or reactants used in the axial chemical vapor deposition are introduced into the center of the ring-shaped plasma to be converted by the heat of the plasma flame into soot which is deposited on a bait. An annular stream of a cooling medium flows outwardly past the plasma flame and is circumferentially centered by an extension of the outer tubular element of a plasma torch in which the plasma is generated. An RF generator which induces the plasma is operated at a frequency exceeding 20 MHz to give the plasma flame the desired ring-sloped configuration.

Claims

1. A method of producing an optical preform, comprising the steps of forming a flow of a heated gaseous medium through and beyond a heating zone, including inducing a ring-shaped plasma in the heating zone for heating the gaseous medium to a predetermined temperature;

introducing only into the center of the ring-shaped plasma at least one reactant capable of undergoing a chemical conversion into an optical material soot at the predetermined temperature for the soot to be formed in, and entrained in the flow of the gaseous medium for travel beyond, the heating zone; and

disposing a bait in the flow of the gaseous medium beyond the heating zone for depositing the entrained optical material soot on the bait and thus growing the optical preform.

2. The method as defined in claim 1, and further comprising the step of sintering the material of the optical preform.

3. The method as defined in claim 1, wherein said forming step includes aiming the flow of the gaseous medium substantially upwardly;

and wherein said disposing step includes positioning the bait above the heating zone.

4. The method as defined in claim 1, wherein said forming step includes forcing an annular stream of a plasma-forming gaseous medium through the heating zone, and inducing the plasma in the annular stream.

5. The method as defined in claim 4, wherein said introducing step includes admitting a stream of gaseous medium containing at least the one reactant into the center of the heating zone separately from the annular stream.

6. The method as defined in claim 5, wherein said forcing and admitting steps are performed coaxially and concurrently.

7. The method as defined in claim 1, and further comprising the step of confining the flow of the gaseous medium through the heating zone in an annular stream of a shielding gaseous medium flowing past the heating zone.

8. The method as defined in claim 1, wherein said inducing step includes subjection the gaseous medium present in the heating zone to an alternating electro-magnetic field af a frequency of at least 20 MHz.

9. The method as defined in claim 1, wherein said introducing step includes admitting halides of glass-forming materials into the heating zone.

10. The method as defined in claim 9, wherein said halides are silicon halide and germanium halide.

11. The method as defined in claim 10, wherein said introducing step further includes supplying at least one additional dopant material into the heating zone.

12. The method as defined in claim 11, wherein said additional dopant material is a gaseous compound.

13. The method as defined in claim 11, wherein said additional dopant material is a member selected from a group consisting of phosphorus, boron, fluorine, titanium, zirconium and thorium compounds.

14. An apparatuus for producing an optical preform, comprising

means for forming a flow of a heated gaseous medium through and beyond a heating zone, including means for inducing a ring-shaped plasma in the heating zone for heating the gaseous medium to a predetermined temperature;

means for introducing only into the center of the ring-shaped plasma at least one reactant capable of undergoing a chemical conversion into an optical material soot at the predetermined temperature for the soot to be formed in, and entrained in the flow of the gaseous medium for travel beyond, the heating zone; and

means for positioning a bait in the flow of the gaseous medium beyond the heating zone for depositing the entrained optical material soot on the bait and thus growing the optical preform.

15. The apparatus as defined in claim 14, wherein said forming and introducing means includes a plasma torch having at least a first elongated tubular element bounding a first flow passage and a second elongated tubular element coaxially surrounding said first tubular element and bounding a second flow passage therewith, said flow passages having downstream ends at and upstream ends remote from the heating zone, means for admitting a plasma-forming aqueous medium and a gaseous medium containing at least the one reactant into said upstream ends respectively of said second and said first flow passage for flow toward the heating zone, and means for subjecting the gaseous medium present in the heating zone to alternating electromagnetic field.

16. The apparatus as defined in claim 15, wherein said plasma torch has an upright orientation such that said gaseous media issue upwardly out of the respective flow passages;

and wherein said positioning means holds the bait above said torch.

17. The apparatus as defined in claim 15, wherein said plasma torch further includes a third tubular element coaxially surrounding said second tubular element and bounding a third flow passage therewith which has a downstream end at and an upstream end remote from the heating zone, and means for admitting a shielding gaseous medium into the upstream end of said third flow passage for flow therethrough to said downstream end and beyond the same past the heating zone.

18. The apparatus as defined in claim 17, wherein said third tubular element has an extension which extends beyond said downstream ends and spacedly surrounds said heating zone.

19. The apparatus as defined in claim 18 wherein said extension has a tubular end portion merging with and having a diameter exceeding that of the remainder of said third tubular element, said end portion being situated at the heating zone.

20. The apparatus as defined in claim 17, wherein said second tubular element has an end portion at said downstream ends of said flow passages which merges with and has a diameter exceeding that of the remainder of said second tubular element.

21. The apparatus as defined in claim 15, wherein said admitting means includes at least one inlet port for each of the passages.

22. The apparatus as defined in claim 21, wherein said inlet port is oriented substantially tangentially of the respective upstream end of the associated flow passage.

23. The apparatus as defined in claim 15, wherein said admitting means includes means for admitting argon, oxygen, or a mixture thereof into said upstream end of said second passage, and a gaseous medium containing at least one halide of a glass forming material into said first passage.

24. The apparatus as defined in claim 15, wherein said subjecting means includes at least one electrically conductive coil spacedly surrounding the heating zone, and means for passing an alternating current at a frequency of at least 20 MHz through said coil.