Cylindrical post magnetron sputtering system

• US 4,525,264 A
• Filed: 12/07/1981
• Issued: 06/25/1985
• Est. Priority Date: 12/07/1981
• Status: Expired due to Fees

• Current Assignee: Ford Motor Company
• Original Assignee: Ford Motor Company
• Inventors: Hoffman, David W.
• Primary Examiner(s): Kaplan, G. L.
• Assistant Examiner(s): Leader, William T.
• Application Number:
  US06/327,971
• Time in Patent Office: 1,296 Days
• Field of Search: 204/192 R, 204/298
• US Class Current: 204/298.22
• CPC Class Codes: H01J 37/3405 Magnetron sputtering

Abstract

In a tubular bodied cathode of a sputtering magnetron, at least one permanent magnet is mounted so as to produce magnetic field flux lines that lie in planes oriented transverse to the axis of the cathode body, along a predetermined length thereof. Through appropriate biasing, in a partial pressure ionizable gas atmosphere, a plasma is generated that resembles a closed loop tunnel extending along said predetermined length on the outer surface of the cylindrical cathode, as defined by the magnetic field. Relative rotation between the cathode and the magnetic field provides for even erosion of sputtering material from the surface of the cathode.

Claims

1. A system for sputtering within a vacuum chamber containing a partial pressure of an ionizable gas including:

means providing a generally cylindrical closed surface cathode having a defined length dimension and the outer portion of said closed surface containing material to be sputtered therefrom;

means defining an anode adjacent said cathode;

means for generating a biasing voltage potential and providing connection of said potential between said cathode means and said anode means;

means mounted within said closed surface cathode means for generating a magnetic field oriented to define a closed loop electron confinement tunnel over the length of said cathode;

said magnetic field generating means including at least two flexible magnets each having oppositely disposed surfaces of opposite polarity adjacently wrapped around a support mandrel so that for each magnet one of said oppositely disposed surfaces faces the mandrel while the other surface is exposed and adjacent exposed surfaces are of opposite polarity, and the joint between the adjacent surfaces defines said closed loop electron confinement tunnel.

2. A system as in claim 1, further including means for producing relative rotational movement between said cathode and said magnetic field generating means.

3. A system as in claim 1, wherein said at least two flexible magnets are elongated strips adjacently disposed and spirally wound about said support mandrel.

4. A system as in claim 3, further including means for producing relative rotational movement between said cathode and said magnetic field generating means.