Process for forming a graded index optical material and structures formed thereby

• US 4,545,646 A
• Filed: 09/02/1983
• Issued: 10/08/1985
• Est. Priority Date: 09/02/1983
• Status: Expired due to Term

• Current Assignee: Dai Nippon Printing Company Limited
• Original Assignee: Hughes Aircraft Company (Rtx Corporation)
• Inventors: Smith, Ronald T., Peters, John W., Chern, Mao-Jin
• Primary Examiner(s): Newsome, John H.
• Application Number:
  US06/528,833
• Time in Patent Office: 767 Days
• Field of Search: 427/162, 427/163, 427/167, 427/53.1, 350/3.72, 350/162.16, 350/413, 350/162.2
• US Class Current: 359/569
• CPC Class Codes: B01J 12/02 for obtaining at least one reaction product which, at normal temperature, is in the solid state
• CPC Class Codes: G01B 5/00 Measuring arrangements characterised by the use of mechanical techniques
• CPC Class Codes: G02B 1/10 Optical coatings produced by application to, or surface treatment of, optical elements G02B1/08 takes precedence
• CPC Class Codes: G02B 5/289 Rugate filters
• CPC Class Codes: Y10S 359/90 Methods
• CPC Class Codes: Y10T 428/24736 Ornamental design or indicia

Abstract

A process for depositing on the surface of a substrate a layer of a chosen material having continuous gradations in refractive index in a predetermined periodic pattern. The substrate is exposed to two vapor phase reactants which react upon radiation-inducement to produce the chosen material, and the relative proportion of the reactants is varied in a predetermined and continuous sequence to produce continuous gradations in the stoichiometric composition and refractive index of the deposited layer as a function of thickness. Additionally, predetermined changes in refractive index and/or thickness across the horizontal surface of the substrate may be produced in combination with the change in refractive index as a function of thickness. Diffraction optical elements formed by such a process include various optical filters and reflective optical coatings.

Claims

1. A process for depositing on the surface of a substrate a layer of a chosen material in which the index of refraction of said layer varies in a predetermined continuous and periodic pattern as a function of the thickness of said layer, comprising the steps of:

(a) providing said substrate;

(b) providing first and second selected vapor phase reactants which react upon inducement by radiation of a selected wavelength to form said chosen material which deposits on said substrate;

(c) exposing said substrate to said first and second vapor phase reactants in predetermined proportions in the presence of said radiation to deposit said chosen material having a first predetermined stoichiometric composition and a first predetermined index of refraction;

(d) altering said predetermined proportions of said first and second vapor phase reactants as a function of time in a continuous manner to correspondingly alter in a continuous manner said stoichiometric composition and said index of refraction of said chosen material deposited as a function of time and to thereby produce said graded index of refraction in said chosen material; and

(e) repeating said altering of step "d" for the number of times required to produce said variation of said refractive index in said predetermined continuous and periodic pattern as a function of said thickness of said layer.

2. The process set forth in claim 1 wherein said variation in said index of refraction of said layer produces a profile selected from the group consisting of a sinusoidal, a quasi-sinusoidal, a superimposed multi-sinusoidal, a squarewave, a triangular, a sawtooth, and a predetermined irregular pattern.

3. The process set forth in claim 1 wherein the intensity of said radiation is substantially constant with time and said radiation exposes the total said surface of said substrate at the same time.

4. The process set forth in claim 1 wherein the intensity of said radiation to which selected segments of said surface of said substrate are exposed is varied in a predetermined pattern across said surface.

5. The process set forth in claim 1 wherein said radiation comprises a collimated beam and said radiation exposes selected segments of said surface of said substrate in turn, each for a predetermined period of time to thereby deposit said layer with a thickness which varies from one said selected segment to the next in a predetermined pattern across the horizontal said surface of said substrate.

6. The process set forth in claim 5 wherein said radiation comprises a scanning laser beam wherein the exposure time of said selected segments to said laser beam is varied in a selected pattern.

7. The process set forth in claim 1 which further includes performing said exposing of step "c" in the presence of mercury vapor to sensitize said reaction upon said inducement by said radiation.

12. An article of manufacture formed by the process set forth in claim 1.

13. The article set forth in claim 12 wherein said layer povides reflection of radiation of a predetermined wavelength impinging on said layer.

14. The article set forth in claim 12 wherein said layer provides transmission of radiation of a predetermined wavelength impinging on said layer.

15. The article set forth in claim 12 wherein:

(a) said substrate is an optical mirror; and

(b) said layer comprises homogeneous compositionally graded silicon oxide.

16. The article set forth in claim 12 wherein:

(a) said substrate is selected from the group consisting of a glass and a plastic material;

(b) said chosen material is an oxide of silicon;

(c) said index of refraction varies from 1.45 to 1.63; and

(d) said predetermined periodic profile is sinusoidal.

8. A process for depositing on the surface of a substrate a layer of an oxide material with a graded index of refraction and a predetermined periodic refractive index profile throughout the thickness of said layer, comprising the steps of:

(a) providing said substrate;

(b) providing a selected vapor phase reactant and a chosen oxygen-containing precursor which react upon inducement by radiation of a selected wavelength to form said oxide material which deposits on said substrate;

(c) exposing said substrate to said vapor phase reactant and said oxygen-containing precursor in predetermined proportions in the presence of said radiation to form said oxide material having a first predetermined stoichiometric composition and a first predetermined index of refraction;

(d) altering said predetermined proportions of said vapor phase reactant and said oxygen-containing precursor as a function of time in a continuous manner to correspondingly alter in a continuous manner said stoichiometric composition and said index of refraction of said oxide material deposited as a function of time and to thereby produce said graded index of refraction in said oxide material; and

(e) repeating said altering of step "d" for the number of times required to produce said predetermined periodic refractive index profile throughout said thickness of said layer.

9. The process set forth in claim 8 wherein:

(a) said oxide is a silicon oxide, SiO_x where x has a value within the range of 1 to 2;

(b) said vapor phase reactant is silane (SiH₄);

(c) said oxygen-containing precursor is nitrous oxide (N₂ O);

(d) said exposing is performed in the presence of mercury vapor;

(e) said index of refraction is graded over the range from 1.45 to 1.9; and

(f) said predetermined periodic refractive index profile has a sinusoidal pattern.

10. The process set forth in claim 8 wherein:

(a) said oxide material comprises a composite of first and second oxides and the composition of said oxide material varies in a gradual and continuous manner along the continuum from said first oxide alone to said second oxide alone;

(b) first and second vapor phase reactants are provided as precursors to said first and second oxides;

(c) a third vapor phase reactant is provided to chemically interact with said first and second vapor phase reactants to form said first and second oxides; and

(d) said predetermined proportions of said first, second, and third vapor phase reactants are altered in said continuous manner to produce said predetermined refractive index profile throughout said thickness of said layer of said oxide material.

11. An article of manufacture comprising:

(a) a selected substrate; and

(b) a layer of a uniform chosen material deposited on the surface of said substrate to a predetermined thickness wherein said layer as deposited has a stoichiometric composition which varies in a predetermined periodic and continuous pattern as a function of said thickness to produce successive gradations in the index of refraction in said layer in said predetermined periodic pattern.

17. An article of manufacture comprising:

(a) a selected substrate; and

(b) a layer of a chosen material deposited on the surface of said substrate to a thickness having a predetermined profile wherein the stoichiometric composition of said layer as deposited varies in a first predetermined periodic and continuous pattern as a function of thickness and in a second predetermined pattern across the horizontal said surface of said substrate to produce successive gradations in said index of refraction in said first and second predetermined patterns as a function of said thickness and as a function of the lateral position on said horizontal surface of said substrate.

18. The article of claim 17 wherein said article is a diffraction optical element, said layer is of uniform thickness, and the peak reflection wavelength of said optical element varies across said horizontal surface of said substrate in a manner corresponding to said second predetermined pattern.

19. The article of claim 17 wherein said article is a diffraction optical element, said thickness varies across said surface of said substrate in said predetermined profile and the peak reflection wavelength of said optical element varies across said horizontal surface of said substrate as a function of said thickness and said second predetermined pattern.

20. An article of manufacture comprising:

(a) a selected substrate; and

(b) a layer of a chosen material deposited on the surface of said substrate to a thickness having a predetermined variation in profile across said surface of said substrate wherein the stoichiometric composition of said layer varies in a predetermined periodic and continuous pattern as a function of said thickness to produce successive gradations in the index of refraction of said layer in said predetermined pattern.

21. A process for depositing on the surface of a substrate a layer of a chosen substance comprising a composite of first and second chosen materials, in which the index of refraction of said layer varies in a predetermined continuous and periodic pattern as a function of the thickness of said layer, comprising the steps of:

(a) providing said substrate;

(b) providing first and second selected vapor phase reactants which react upon inducement by radiation of a selected wavelength to form said first chosen material which deposits on said substrate;

(c) providing a third selected vapor phase reactant which reacts with said first selected vapor phase reactant upon inducement by radiation of said selected wavelength to form said second chosen material which deposits on said substrate;

(d) exposing said substrate to said first, second, and third vapor phase reactants in predetermined proportions in the presence of said radiation to deposit said chosen substance having a first predetermined stoichiometric composition and a first predetermined index of refraction;

(e) altering said predetermined proportions of said first, second, and third vapor phase reactants as a function of time in a continuous manner to correspondingly alter in a continuous manner said stoichiometric composition and said index of refraction of said chosen substance deposited as a function of time; and

(f) repeating said altering of step "e" for the number of times required to produce said variation of said refractive index in said predetermined continuous and periodic pattern as a function of said thickness of said layer.

22. The process of claim 21 wherein:

(a) said first chosen material is silicon dioxide; and

(b) said second chosen material is silicon nitride.