Water-polishing loop

• US 4,595,498 A
• Filed: 12/27/1984
• Issued: 06/17/1986
• Est. Priority Date: 12/27/1984
• Status: Expired due to Term

• Current Assignee: SGS-Thomson Microelectronics (STMicroelectronics NV)
• Original Assignee: Thomson Components-Mostek Corporation
• Inventors: Gopffarth, Wilford H., Browning, Joel W., Cohen, Judith S.
• Primary Examiner(s): Castel, Benoit
• Application Number:
  US06/686,861
• Time in Patent Office: 537 Days
• Field of Search: 210/257.2-259, 210/295, 210/668, 210/900, 210/192, 210/194, 210/195.2, 210/197, 210/638, 210/760, 210/764, 210/748, 210/195.1, 210/188, 210/196, 210/202, 422/199, 422/205, 250/430, 250/436, 250/438, 250/527
• US Class Current: 210/192
• CPC Class Codes: B01D 2313/18 Specific valves
• CPC Class Codes: B01D 61/145 Ultrafiltration
• CPC Class Codes: B01D 61/18 Apparatus therefor
• CPC Class Codes: B01D 63/00 Apparatus in general for separation processes using semi-permeable membranes
• CPC Class Codes: C02F 1/001 Processes for the treatment of water whereby the filtration technique is of importance C02F1/44 takes precedence; construction of filters in general B01D24/00 - B01D41/00
• CPC Class Codes: C02F 1/20 by degassing, i.e. liberation of dissolved gases degasification of liquids in general B01D19/00; arrangement of degassing apparatus in boiler feed supply F22D
• CPC Class Codes: C02F 1/32 with ultraviolet light
• CPC Class Codes: C02F 1/42 by ion-exchange ion-exchange in general B01J
• CPC Class Codes: C02F 1/444 by ultrafiltration or microfiltration
• CPC Class Codes: C02F 1/78 with ozone C02F1/4672 takes precedence
• CPC Class Codes: C02F 2103/04 for obtaining ultra-pure water
• CPC Class Codes: C02F 2301/046 Recirculation with an external loop
• CPC Class Codes: C02F 9/00 Multistage treatment of water, waste water or sewage

Abstract

A water purification system includes an ion-exchange unit for producing high-resistivity water, followed by ozone exposure and ultraviolet sterilizer units that oxidize organics and also reduce resistivity, followed by a vacuum degassification unit to restore high resistivity.

Claims

1. In a water-purification system, an improved water-polishing loop comprising:

an inlet pipe for receiving previously purified water;

an ultraviolet-light exposure unit;

an ion-exchange unit;

a first filter unit;

an outlet pipe;

a first recirculation pipe connected between said outlet pipe and said inlet pipe for recirculating highly purified water from said outlet pipe back to mix with said previously purified water, and thereby forming a first recirculation loop;

means for flowing water through said ultra-violet light exposure unit, ion-exchange and first filter units;

characterized in that;

said ion exchange unit is followed by said first filter and ultraviolet-light exposure units;

said ultraviolet exposure unit is preceded by an ozone oxidation unit;

said ultraviolet exposure unit is followed by a vacuum degassification unit, whereby gaseous products of said ozone oxidation unit are removed; and

a second recirculation loop connected to said outlet pipe and which second loop comprises an ultrafilter having an ultrafilter inlet and being connected between said outlet pipe and at least one feed outlet and a second recirculation pipe connected between said at least one feed outlet and said ultrafilter inlet.

2. The combination according to claim 1, further characterized in that:

said ozone oxidation unit and said ultraviolet exposure unit combine to form a combined ultraviolet oxidation unit comprising means in which water containing oxygen is first exposed to ultraviolet light having short wavelengths adapted to form ozone and subsequently exposed to means for exposing said water to ultraviolet light having longer wavelengths adapted to dissociate ozone, whereby the germicidal effect of said ultraviolet light combines with the oxidation effect of ozone and further characterized in that the ultraviolet radiation in said ultraviolet oxidation unit acts to dissociate residual ozone as well as to sterilize.

3. The combination according to claim 2, further characterized in that said combined ultraviolet-oxidation unit is followed by an ultraviolet exposure means for further exposing water to ultraviolet light in a second wavelength region adapted to dissociate ozone.

4. In a water-purification system, an improved water polishing loop comprising:

a first purification stage for further purifying water received from a preliminary stage comprising in fluid communication;

an inlet pipe;

an ion-exchange unit;

a first filter unit following said ion-exchange unit;

first recirculation means for recirculating a portion of water being purified through said ion-exchange unit;

a second purification stage connected to said first recirculation means and comprising in fluid communication;

an ozone oxidation unit comprising means for exposing said water to ozone;

first ultraviolet irradiation means for exposing said water to ultraviolet light in a first wavelength region adapted to convert oxygen to ozone;

degassification means following said first ultraviolet irradiation means for removing dissolved gases from said water;

second recirculation means for recirculating a portion of said water back into said ozone oxidation unit; and

a third purification stage connected to said second recirculation means and containing an ultrafilter and an outlet from said third purification stage.

5. The combination according to claim 4, further comprising a second ultraviolet irradiation means for exposing said water to ultraviolet light in a second wavelength region adapted to dissociate ozone.