Transparent coatings by reactive sputtering

• US 4,769,291 A
• Filed: 02/02/1987
• Issued: 09/06/1988
• Est. Priority Date: 02/02/1987
• Status: Expired due to Fees

• Current Assignee: BOC Group Pty Limited (Linde Plc)
• Original Assignee: BOC Group Pty Limited (Linde Plc)
• Inventors: Jacobson, Donald V., Hofmann, James J., Nadel, Steven J., Bjornard, Erik, Belkind, Abraham I.
• Primary Examiner(s): Andrews, Melvyn J.
• Assistant Examiner(s): WYSZOMIERSKI, GEORGE P
• Application Number:
  US07/010,023
• Time in Patent Office: 582 Days
• Field of Search: 428/627, 428/630, 428/632, 428/641, 428/650, 428/658, 428/673, 428/34, 204/192.15, 204/192.22, 204/192.23, 204/192.26, 204/192.27, 204/192.28, 204/192.29
• US Class Current: 428/630
• CPC Class Codes: C03C 17/22 with other inorganic material C03C17/34, C03C17/44 take precedence
• CPC Class Codes: C03C 17/225 Nitrides
• CPC Class Codes: C03C 17/245 by deposition from the vapour phase
• CPC Class Codes: C03C 17/3417 all coatings being oxide coatings
• CPC Class Codes: C03C 17/3435 comprising a nitride, oxynitride, boronitride or carbonitride
• CPC Class Codes: C03C 17/36 at least one coating being a metal
• CPC Class Codes: C03C 17/3644 the metal being silver
• CPC Class Codes: C03C 2217/23 Mixtures
• CPC Class Codes: C03C 2217/281 Nitrides
• CPC Class Codes: C03C 2217/29 Mixtures
• CPC Class Codes: C03C 2217/78 Coatings specially designed to be durable, e.g. scratch-resistant
• CPC Class Codes: C03C 2218/155 by reactive sputtering
• CPC Class Codes: C23C 14/08 Oxides C23C14/10 takes precedence
• CPC Class Codes: C23C 14/10 Glass or silica
• CPC Class Codes: Y10T 428/12597 Noncrystalline silica or noncrystalline plural-oxide component [e.g., glass, etc.]
• CPC Class Codes: Y10T 428/12611 Oxide-containing component
• CPC Class Codes: Y10T 428/12674 Ge- or Si-base component
• CPC Class Codes: Y10T 428/12736 Al-base component
• CPC Class Codes: Y10T 428/12792 Zn-base component
• CPC Class Codes: Y10T 428/12896 Ag-base component

Abstract

A method for depositing a protective coating by cathode sputtering of an alloy of aluminum and silicon in a reactive gas is disclosed. The sputtering target contains sufficient silicon to produce an amorphous coating; 6 to 18 percent silicon is preferred. Targets of approximately 88% aluminum and 12% silicon are especially preferred. Oxygen, nitrogen, compounds of oxygen and compounds of nitrogen are preferred reactive gases. A range of combinations of oxygen and nitrogen are particularly preferred. The method provides durable transparent coatings which may be used as an overcoating for a metal or dielectric coating to provide increased resistance to abrasion and corrosion. In particular, the protected coating may be a metal, dielectric or dielectric-metal-dielectric coating as used in double-glazed window units for buildings or vehicles.

Claims

1. A method for depositing a coating and a protective overcoating on a substrate comprising:

depositing a coating on the substrate;

preparing a sputtering target of an alloy comprising aluminum and sufficient silicon to produce an amorphous overcoating;

placing the target and the coated substrate in an evacuated chamber; and

sputtering the target in an atmosphere comprising a gas having components which react with aluminum and silicon so as to form a transparent amorphous dielectric overcoating containing reaction products of aluminum and silicon.

2. The method according to claim 1, wherein the alloy comprises greater than about 6 percent and less than about 95% silicon.

3. The method according to claim 2, wherein the reactive gas is selected from the group consisting of oxygen nitrogen, compounds of oxygen, and compounds of nitrogen.

4. The method according to claim 3, wherein the substrate is transparent and the step of depositing a coating comprises depositing a dielectric-metal-dielectric coating by sputtering.

5. A method for depositing a transparent coating on a substrate comprising:

preparing a sputtering target of an alloy comprising aluminum and 6 to 18 percent silicon;

placing the target and the substrate in an evacuated chamber;

sputtering the target in an atmosphere comprising a gas having components which react with aluminum and silicon so as to form an amorphous dielectric coating containing reaction products of aluminum and silicon.

6. The method according to claim 5, wherein the reactive gas is selected from the group consisting of nitrogen, oxygen, compounds of oxygen, and compounds of nitrogen.

7. The method according to claim 6, wherein the alloy comprises 82 to 90 percent aluminum and 10 to 14 percent silicon.

8. The method according to claim 7, wherein the alloy comprises approximately 88 percent aluminum and 12 percent silicon with incidental impurities.

9. The method according to claim 6, wherein the reactive gas comprises oxygen and nitrogen and the ratio of oxygen to the total of oxygen and nitrogen is in the range 0.1 to 0.3.

10. The method according to claim 9, wherein the alloy comprises 82 to 90 percent aluminum and 10 to 14 percent silicon.

11. The method according to claim 10, wherein the alloy comprises approximately 88 percent aluminum and 12 percent silicon with incidental impurities.

12. A coated article comprising a substrate, a coating on the substrate, and a protective overcoating on the coating where the overcoating comprises an amorphous dielectric layer of reaction products formed by sputtering a target in a reactive gas wherein the target is an alloy comprising aluminum and silicon.

13. A coated article according to claim 12, wherein the alloy comprises 6 to 95 percent silicon and the reactive gas is selected from the group consisting of oxygen, nitrogen, compounds of oxygen, and compounds of nitrogen.

14. A coated article according to claim 13, wherein the substrate is transparent, the coating comprises a multilayer dielectric-metal-dielectric coating, and the materials of the dielectric layers are selected from the group consisting of oxides of bismuth, indium, tin, titanium and zinc.

15. The coated article according to claim 13, wherein the coating is a dielectric-metal-zinc oxide.

16. The coated article according to claim 15, wherein the reactive gas contains oxygen and nitrogen and the ratio of oxygen to the total of oxygen and nitrogen is in the range 0.1 to 0.3.

17. The coated article according to claim 13, wherein the reactive gas contains oxygen and nitrogen and the ratio of oxygen to the total of oxygen and nitrogen is in the range 0.1 to 0.3.

18. The coated article according to claim 17, wherein the coating is a dielectric-silver coating.

19. A coated article comprising a substrate and an amorphous dielectric coating of reaction products formed by sputtering a target comprising an alloy of aluminum and 6 to 18 percent silicon in a reactive gas.

20. The article according to claim 19, wherein the reactive gas is selected from the group consisting of oxygen, nitrogen, compounds of oxygen, and compounds of nitrogen.

21. The coated article according to claim 20, wherein the reactive gas contains oxygen and nitrogen and the ratio of oxygen to the total of oxygen and nitrogen is in the range 0.1 to 0.3.

22. The coated article according to claim 21, wherein the substrate comprises a transparent base and a dielectric-metal coating over which the amorphous coating is deposited.

23. The article according to claim 21, wherein the substrate comprises a transparent base and a dielectric-metal-zinc oxide coating over which the amorphous coating is deposited.

24. The coated article according to claim 23, wherein the alloy contains approximately 88 percent aluminum and 12 percent silicon with incidental impurities.

25. The coated article of claim 24, further comprising a transparent sheet, and means for sealing the sheet and the base to form a double-glazed window unit with the amorphous coating inside.