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Light filters for microelectronics

  • US 4,876,165 A
  • Filed: 01/12/1987
  • Issued: 10/24/1989
  • Est. Priority Date: 09/30/1982
  • Status: Expired due to Term
First Claim
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1. In a process of making microelectronic color filter elements by microphotolithography, the improvement comprising, applying a layer of a substantially non-particulate filter coating material to a filter substrate, the filter coating material including a vehicle and a soluble dye incorporation therein, the soluble dye being heat stable and in combination with the vehicle being effective to produce a high color resolution, applying a photoresist to the layer of the filter coating material on the filter substrate, photographically imaging and developing the photoresist, the filter coating material imaging and developing with the photoresist, curing the color element to substantially insolubilize the color element, the cured filter element containing the stable dye being effective to consistently transmit and resolve colored light, the cured filter element containing the stable dye having a high electrical resistivity and a high dielectric strength.

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