Method for producing magnetic recording medium

• US 4,990,361 A
• Filed: 08/28/1989
• Issued: 02/05/1991
• Est. Priority Date: 04/16/1987
• Status: Expired due to Term

• Current Assignee: Fujifilm Corporation (Fujifilm Holdings Corporation)
• Original Assignee: Fuji Photo Film Co Limited (Fujifilm Holdings Corporation)
• Inventors: Yasunaga, Tadashi, Sasazawa, Koji, Yanai, Akio
• Primary Examiner(s): PIANALTO, BERNARD D
• Application Number:
  US07/403,075
• Time in Patent Office: 526 Days
• Field of Search: 427/38, 427/127-132, 427/48, 427/255.2, 427/35, 427/36, 427/39, 427/45.1, 427/54.1, 428/694, 428/900
• US Class Current: 427/575
• CPC Class Codes: G11B 5/85 Coating a support with a magnetic layer by vapour deposition

Abstract

A method and apparatus for producing a magnetic recording medium having an improved durability with a simple process. Nitrogen molecules and/or nitrogen atoms in an excited state are applied to a nonmagnetic substrate simultaneously with an iron vapor flow and an ion flow. The resulting magnetic recording medium has superior corrosion resistance and can be produced at a high film forming rate, and is especially suitable for high density recording because of its high coercive force.

Claims

1. A method for producing a magnetic recording medium in which an iron nitride ferromagnetic thin film containing at least iron and nitrogen is formed on a nonmagnetic substrate, comprising the steps of:

applying at least one of uncharged nitrogen molecules in an excited state and uncharged nitrogen atoms in an excited state to said nonmagnetic substrate; and

simultaneously applying an uncharged iron vapor flow and a charged ion flow to said substrate to thereby form said thin film on said nonmagnetic substrate.

2. The method of claim 1, wherein said ion flow is a nitrogen ion flow.

3. The method of claim 1, wherein said ion flow is an argon ion flow.

4. The method of claim 1, wherein said ion flow is an oxygen ion flow.

5. The method of claim 1, wherein said iron vapor flow is directed at an oblique angle to a surface of said substrate.

6. The method of claim 5, wherein said oblique angle is approximately 65°

.

7. The method of claim 1, wherein said iron flow is produced by an ion gun.

8. The method of claim 1, wherein said ion flow contains at least one of nitrogen ions, oxygen ions, and argon ions.

9. The method of claim 1, wherein said step of applying said at least one of nitrogen molecules and atoms in an excited state comprises exciting nitrogen by a low temperature plasma.

10. The method of claim 9, wherein said low temperature plasma is produced by DC/AC glow discharge.

11. The method of claim 9, wherein said low temperature plasma is produced by a high frequency discharge.

12. The method of claim 9, wherein said low temperature plasma is produced by electron collisions.

13. The method of claim 12, wherein an energy of said electron collisions is in a range of 50 to 200 eV.

14. The method of claim 9, wherein said low temperature plasma is produced by microwaves.

15. The method of claim 1, wherein said step of applying said at least one of nitrogen molecules and atoms in an excited state comprises exciting nitrogen by ultraviolet light X-rays.