Apparatus and method for automatically identifying chemical species within a plasma reactor environment

• US 5,014,217 A
• Filed: 02/09/1989
• Issued: 05/07/1991
• Est. Priority Date: 02/09/1989
• Status: Expired due to Fees

• Current Assignee: SCT Technology, Ltd.
• Original Assignee: SCT Technology, Ltd.
• Inventors: Savage, Richard N.
• Primary Examiner(s): Lall, Parshotam S.
• Assistant Examiner(s): Ramirez, Ellis B.
• Application Number:
  US07/308,570
• Time in Patent Office: 817 Days
• Field of Search: 364/498, 364/499, 364/552, 364/550, 364/468, 364/500, 156/345, 156/626, 156/627, 204/192.13, 204/192.25, 204/192.15, 204/192.33, 250/281, 250/288, 73/863, 73/863.01
• US Class Current: 702/28
• CPC Class Codes: C23C 16/52 Controlling or regulating the coating process C23C16/45557, C23C16/279 take precedence
• CPC Class Codes: G01J 2003/2833 and memorised spectra collection
• CPC Class Codes: G01J 2003/2873 Storing reference spectrum
• CPC Class Codes: G01N 21/62 Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light

Abstract

A method and apparatus to control the plasma environment in a semiconductor or thin-film fabrication chamber. The apparatus and method include a means for measuring an optical emission spectrum of the chemical species in the plasma and a library containing a multiplicity of predefined spectral patterns. A processor automatically correlates the spectrum with the predefined spectral patterns in the library, and yields a correlation value for all the correlations. A subset of the predefined spectral patterns based upon the highest correlation values are selected and used to identify the chemical species and abundances thereof in the plasma. A comparator compares the subset with a target set of plasma species and abundances and a control signal generator generates a control signal in response to the comparison to control the chamber environment. In a preferred embodiment, the control signal controls the plasma environment in the reactor chamber when said subset differs from said target set by a predefined amount.

Claims

1. In a method to control the environment of a plasma chamber containing at least one chemical species during a semiconductor fabrication procedure, comprising the steps of:

generating a sample spectrum indicative of the chemical species in the plasma;

providing a library containing a multiplicity of predefined spectral patterns, each spectral pattern being indicative of a particular chemical species;

automatically correlating said spectrum with said predefined spectral patterns in said library, and yielding a correlation value for each libraried spectrum pattern;

identifying the chemical species in the plasma based on the highest correlation values, and generating an identifier list indicating the chemical species and abundances thereof in the plasma.

2. The method of claim 1, wherein said library of said predefined spectral patterns range from a minimum spectrum wavelength of 100 to maximum spectrum wavelength of 2000 nanometers, and said step of generating a spectrum indicative of the chemical species in the plasma is performed at a sampling rate of at least one hundred samples per second.

3. The method of claim 1, wherein said step of automatically correlating said spectrum with said predefined spectral patterns in said library is performed at a rate of at least one hundred samples per second.

4. The method of claim 1, wherein each said automatic correlation step includes the steps of:

generating a product spectrum by multiplying the amplitude of a selected library spectrum and the actual sample spectrum within a selected wavelength range; and

subtracting said actual sample spectrum from said product spectrum, wherein the presence of a peak in the resulting spectral waveform identifies the presence of the chemical species associated with the library spectrum in the actual plasma sample.

5. The method of claim 4, wherein the area under said resultant peak indicates the degree of accuracy of said correlation species identification step, and the amplitude of said resultant peak indicates the relative abundance of the species at the time the sample was taken.

6. The method of claim 1 further comprising the step of comparing said identified species and abundances with a target set of plasma species and abundances and determining the deviation of the identified species from said target.

7. The method of claim 6, further comprising the step of generating a control signal when said comparison yields a result greater than a predetermined deviation value, said control signal controlling the chamber environment.

8. The method of claim 7, wherein said control signal is adapted to control the chamber environment by regulating the plasma pressure, the abundances of particular chemical species in the plasma, and the ion level within the plasma.

9. In a method to control the environment of a processing chamber containing at least one chemical species comprising the steps of:

generating a sample spectrum indicative of the chemical species in the plasma;

providing a library containing a multiplicity of predefined spectral patterns, each spectral pattern being indicative of a particular chemical species;

automatically correlating said spectrum with said predefined spectral patterns in said library, and yielding a correlation value for each libraried spectrum pattern;

identifying the chemical species in the plasma based upon the highest correlation values, and generating an identifier list indicating the chemical species and abundances thereof in the plasma; and

comparing said identified species and volumes with a target set of plasma species and volumes and determining the deviation of the identified species from said target.

10. The method of claim 9, further comprising the step of generating a control signal when said comparison yields a result greater than a predetermined deviation value, said control signal controlling the chamber environment.

11. The method of claim 9, further comprising the step of controlling the chamber environment when said subset differs from said target set by a predefined deviation range.

12. In an apparatus to control the plasma environment in a semiconductor fabrication chamber containing at least one chemical species, comprising:

a means for generating a sample spectrum indicative of the chemical species in the plasma;

a means for providing a library containing a multiplicity of predefined spectral patterns, each spectral pattern being indicative of a particular chemical species;

a means for automatically correlating said spectrum with said predefined spectra patterns in said library, and yeilding a correlation value for each libraried spectrum pattern;

a means for identifying the chemical species in the plasma based upon the highest correlation values, and generating an identifier list indicating the chemical species and volumes thereof in the plasma.

13. The apparatus of claim 12, further comprising means for controlling the plasma in the semiconductor chamber when said subset differs from said target set by a predefined deviation range.

14. In an apparatus to automate the control of the plasma environment in a semiconductor fabrication chamber containing at least one chemical species using spectroscopy to identify chemical and molecular species to a high degree of accuracy in the chamber, comprising:

a means for generating a sample spectrum of the chemical species in the plasma;

a means for providing a library containing a multiplicity of predefined spectral patterns;

a processing for receiving said spectrum of intensity signals, said processor automatically correlating said sample spectrum with said multiplicity of predefined library spectra, and identifying the chemical species and abundances in the chamber plasma based on said correlation.

15. The apparatus of claim 14 further comprising a pressure sensor adapted to sense chamber pressure and to generate a pressure signal;

and a power meter adapted to sense chamber ion level and to generate an ion level signal;

wherein said processor is adapted to receive said pressure signal and said ion level signal.

16. The apparatus of claim 15, wherein said processor is adapted to compare said identified chemical species and abundances with a target set of chemical species and abundances, to compare said plasma pressure signal to a target pressure value and to compare said plasma ion level signal to a target ion level value.

17. The apparatus of claim 16, wherein said apparatus further includes a number of chamber periphery devices to control the plasma environment in the chamber, including a means for introducing chemical species gases into the chamber, a means to regulate plasma ion concentration levels and a means to exhaust plasma gases from the chamber.

18. The apparatus of claim 17, further including a controller electrically adapted to respond to said comparator, said controller generating a control signal to control said periphery devices if said comparisons deviate beyond said target values.

19. The apparatus of claim 18, wherein said processor, said comparator and said controller are controlled by a control system software program, and said library of said predefined library spectra and said target values are stored in processor memory.