Surface modification of plastic substrates

• US 5,098,618 A
• Filed: 03/14/1990
• Issued: 03/24/1992
• Est. Priority Date: 03/14/1990
• Status: Expired due to Fees

• Current Assignee: Joseph Zelez
• Original Assignee: Joseph Zelez
• Inventors: Zelez, Joseph
• Primary Examiner(s): Thurlow, Jeffery
• Application Number:
  US07/493,274
• Time in Patent Office: 741 Days
• Field of Search: 264/22, 264/83, 264/1.4, 425/174.4, 425/174
• US Class Current: 264/446
• CPC Class Codes: B29C 2035/0827 using UV radiation
• CPC Class Codes: B29C 59/16 by wave energy or particle radiation , e.g. infrared heating B29C59/007 takes precedence
• CPC Class Codes: B29K 2027/06 PVC, i.e. polyvinylchloride
• CPC Class Codes: B29L 2011/0016 Lenses

Abstract

The present invention is a process for treating plastic substrates to improve their surface properties. The process involves exposing the plastic substrate to UV radiation at wavelengths of 185 and 254 nm in the presence of atomic oxygen for about 5 to 60 minutes. The treated plastic substrates have improved wettability. The process is particularly well suited for the treatment of plastic intraocular lenses and plastic packaging materials such as PVC film.

Claims

1. A process for treating a plastic substrate to increase its hydrophilic wettability and reduce its hydrophobicity, said process comprising:

(a) providing a plastic substrate; and

(b) exposing said plastic substrate to electromagnetic radiation from a source emitting radiation in the UV region at wavelengths of about 185 nm and about 254 nm at an energy of from about 10 to about 15 mWatts/cm² for a period of time between about 5 and 120 minutes at a distance of not more than about 0.75 cm from said source in the presence of oxygen and in the substantial absence of any other gas to thereby increase its hydrophilic wettability and reduce its hydrophobicity.

2. A process according to claim 1, wherein in addition to said oxygen a gas selected from the group consisting of argon, carbon dioxide, nitrogen and mixtures thereof is present during said exposure to radiation.

3. A process according to claim 2, wherein said additional gas is present during said exposure to radiation in a ratio of oxygen to said additional gas of from about 1:

3 to about 3;

1.

4. A process according to claim 3, wherein argon is present during said exposure to radiation in a ratio of oxygen to argon of from about 1:

2 to about 2;

1.

5. A process according to claim 1, wherein said source is a low pressure quartz mercury vapor lamp.

6. A process according to claim 1, wherein said period of time is between about 5 and about 60 minutes.

7. A process according to claim 1, wherein said plastic substrate comprises a plastic selected from the group consisting of polyethylene, polypropylene, polystyrene, polymethylmethacrylate (PMMA), silicone-elastomers, polyurethenes, polyamides, polyimides, PET, PVC, PVDC, a polyether, an acrylate and ABS.