Cationic silicone surfactant and method of its manufacture
First Claim
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1. A cationic silicone surfactant represented by the following general formula (I) ##STR18## wherein each R1 may be the same as or different from every other R1, and each represents an unsubstituted or halogen-substituted monovalent hydrocarbon residue of 1 to 20 carbon atoms;
- R2 represents a hydrogen atom, or an unsubstituted or hydroxyl-substituted monovalent hydrocarbon residue of 1 to 10 carbon atoms;
R3 represents a hydrogen atom, or an unsubstituted or hydroxyl-substituted monovalent hydrocarbon residue of 1 to 20 carbon atoms;
R4 represents an unsubstituted or halogen- or hydroxyl-substituted divalent hydrocarbon residue of 1 to 10 carbon atoms, or a group formed by replacing less than one-half of the carbon atoms contained in said hydrocarbon residue by oxa atom(s);
X represents a halogen which is fluorine, chlorine, bromine or iodine; and
"a" represents a number satisfying the inequality 3≦
a≦
20.
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Abstract
A cationic silicone surfactant with excellent surface tension lowering properties and manufacturing method thereof were disclosed. Since a siloxane with a reactive group at one end is used as starting material for production process, the surfactant of the present invention is an AB type block copolymer which has an ideal structure as a surfactant and can exhibit excellent surface tension lowering properties in aqueous systems or solvent systems.
33 Citations
6 Claims
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1. A cationic silicone surfactant represented by the following general formula (I) ##STR18## wherein each R1 may be the same as or different from every other R1, and each represents an unsubstituted or halogen-substituted monovalent hydrocarbon residue of 1 to 20 carbon atoms;
- R2 represents a hydrogen atom, or an unsubstituted or hydroxyl-substituted monovalent hydrocarbon residue of 1 to 10 carbon atoms;
R3 represents a hydrogen atom, or an unsubstituted or hydroxyl-substituted monovalent hydrocarbon residue of 1 to 20 carbon atoms;
R4 represents an unsubstituted or halogen- or hydroxyl-substituted divalent hydrocarbon residue of 1 to 10 carbon atoms, or a group formed by replacing less than one-half of the carbon atoms contained in said hydrocarbon residue by oxa atom(s);
X represents a halogen which is fluorine, chlorine, bromine or iodine; and
"a" represents a number satisfying the inequality 3≦
a≦
20. - View Dependent Claims (2, 3, 4, 5, 6)
- R2 represents a hydrogen atom, or an unsubstituted or hydroxyl-substituted monovalent hydrocarbon residue of 1 to 10 carbon atoms;
Specification
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Current AssigneeShin-Etsu Chemical Company Limited
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Original AssigneeShin-Etsu Chemical Company Limited
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InventorsMeguriya, Noriyuki, Tanaka, Masaki, Azechi, Syuuichi
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Primary Examiner(s)Stoll, Robert L.
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Assistant Examiner(s)Metzmaier, Daniel S.
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Application NumberUS07/447,933Time in Patent Office928 DaysField of Search252/351, 252/357, 556/425, 556/413US Class Current556/425CPC Class CodesC07F 7/0838 Compounds with one or more ...C08G 77/045 containing less than 25 sil...C11D 1/62 Quaternary ammonium compoundsC11D 3/3742 Nitrogen containing siliconesY10S 516/01 Wetting, emulsifying, dispe...Y10S 516/07 Organic amine, amide, or n-...Y10S 516/906 The agent contains organic ...
