Multi-layer address lines for amorphous silicon liquid crystal display devices

  • US 5,153,754 A
  • Filed: 11/29/1989
  • Issued: 10/06/1992
  • Est. Priority Date: 06/30/1989
  • Status: Expired due to Term
First Claim
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1. An electrically conductive address line for fabrication upon a relatively large insulative substrate surface, comprising:

  • a first layer of an electrically conductive, laser-weldable material disposed on said insulative substrate surface and selected to adhere thereto; and

    a second layer of an electrically conductive, low bulk resistivity material directly disposed upon said first layer to form a multi-layer conductive line;

    said second layer of conductive material being selected from the group consisting of molybdenum and aluminum;

    said first and second layers being disposed between and electrically coupled to selected ones of a plurality of active semiconductor devices positioned on said insulative substrate surface in an array having an area greater than about four square inches.

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