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Thin film field effect transistor array for use in active matrix liquid crystal display

  • US 5,182,661 A
  • Filed: 06/25/1991
  • Issued: 01/26/1993
  • Est. Priority Date: 06/25/1990
  • Status: Expired due to Term
First Claim
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1. A thin film field effect transistor array comprising a transparent insulative substrate, a plurality of parallel gate bus lines formed on said transparent insulative substrate, a plurality of parallel drain bus lines formed on said transparent insulative substrate so as to intersect said gate bus lines, a plurality of pixel electrodes each formed in proximity of a corresponding one of intersections between said gate bus lines and said drain bus lines, a plurality of thin film field effect transistors each formed in proximity of a corresponding one of intersections between said gate bus lines and said drain bus lines, each of said thin film field effect transistors being connected to a corresponding one of said pixel electrodes, and a plurality of storage capacitors each formed in proximity of and connected in parallel to a corresponding one of said pixel electrodes, each of said storage capacitors being formed of a stacked structure having at least first, second and third level capacitor electrodes which are stacked in the named order and separated from each other by an intervening insulating layer, at least one of said first, second and third level capacitor electrodes being connected to a corresponding one of said gate bus lines, wherein said gate bus line is formed on the transparent insulative substrate and a first insulator layer is formed to cover said gate bus line, wherein said first level capacitor electrode is formed on said first insulator layer so as to be offset from said gate bus line and a second insulator layer is formed to cover said first level capacitor electrode, wherein said second level capacitor electrode is formed on said second insulator layer so as to partially overlap said gate bus line and said first level capacitor electrode, said second level capacitor electrode being connected to said gate bus line through a contact hole formed to pierce through said first and second insulator layers, and said third insulator layer is formed to cover said second level capacitor electrode, and wherein said third level capacitor electrode is formed of said pixel electrode which is formed on said third insulator layer so as to overlap said second level capacitor electrode, said pixel electrode being connected to said first level capacitor electrode through a contact hole formed to pierce through said second and third insulator layers.

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