Method of making atomically sharp tips useful in scanning probe microscopes
First Claim
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1. A process for the formation of microtips, said process comprising the following steps:
- exposing a patterned substrate to a plasma, thereby creating microtips having a tip size less than 10Å
; and
segmenting the substrate in order to separate at least some of the plurality of microtips from each other.
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Abstract
An in situ plasma dry etching process for the formation of atomically sharp tips for use in high resolution microscopes in which i) a mask layer is deposited on a substrate, ii) a photoresist layer is patterned superjacent the mask layer at the sites where the tips are to be formed, iii) the mask is selectively removed by plasma etching, iv) after which the substrate is etched in the same plasma reacting chamber, thereby creating sharp microscope tips.
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15 Claims
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1. A process for the formation of microtips, said process comprising the following steps:
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exposing a patterned substrate to a plasma, thereby creating microtips having a tip size less than 10Å
; andsegmenting the substrate in order to separate at least some of the plurality of microtips from each other. - View Dependent Claims (2, 3, 4, 5, 6, 7)
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8. A method for controlling aspect ratios useful for forming very sharp asperities comprising the following step:
isotropically etching a substrate having a mask layer disposed thereon, thereby forming said sharp asperities in a single etch step, said sharp asperities having a tip size of less than 10Å
.- View Dependent Claims (9, 10, 11, 12, 13, 14, 15)
Specification