Process for coating a substrate with zinc oxide and uses for coated substrates

• US 5,306,522 A
• Filed: 08/12/1991
• Issued: 04/26/1994
• Est. Priority Date: 03/24/1986
• Status: Expired due to Fees

• Current Assignee: Ensci, Inc.
• Original Assignee: Ensci, Inc.
• Inventors: Clough, Thomas J., Pinsky, Naum, Grosvenor, Victor L.
• Primary Examiner(s): Bell, James J.
• Application Number:
  US07/743,738
• Time in Patent Office: 988 Days
• Field of Search: 427/126.3, 427/126.1, 427/126.2, 427/215, 427/216, 427/376.2, 427/217
• US Class Current: 427/126.3
• CPC Class Codes: C04B 14/4631 Silica
• CPC Class Codes: C04B 30/02 containing fibrous materials
• CPC Class Codes: C04B 35/56 based on carbides or oxycarbides containing free metal binder C22C29/00
• CPC Class Codes: C04B 41/009 characterised by the material treated
• CPC Class Codes: C04B 41/4523 applied from the molten state vitreous materials C04B41/5022; Thermal spraying, e.g. plasma spraying
• CPC Class Codes: C04B 41/4545 applied as a powdery material
• CPC Class Codes: C04B 41/455 the coating or impregnating process including a chemical conversion or reaction
• CPC Class Codes: C04B 41/5036 Ferrites
• CPC Class Codes: C04B 41/87 Ceramics
• CPC Class Codes: Y10T 428/1157 Substrate composition
• CPC Class Codes: Y10T 428/29 Coated or structually defined flake, particle, cell, strand, strand portion, rod, filament, macroscopic fiber or mass thereof
• CPC Class Codes: Y10T 428/2958 Metal or metal compound in coating
• CPC Class Codes: Y10T 428/2982 Particulate matter [e.g., sphere, flake, etc.]
• CPC Class Codes: Y10T 428/2991 Coated

Abstract

Processes for coating substrates, in particular substrates including shielded surfaces, with zinc oxide-containing coatings are disclosed. Such processes comprise contacting a substrate with a zinc oxide precursor, preferably maintaining the precursor coated substrate at conditions to equilibrate the coating, and then oxidizing the precursor to form a substrate containing zinc oxide. Also disclosed are substrates coated with zinc oxide-containing coatings for use in various applications.

Claims

1. A process for coating an inorganic three dimensional substrate with doped zinc oxide comprising:

contacting an inorganic three dimensional substrate which includes external surfaces and shielded surfaces which are at least partially shielded by other portions of said substrate with a composition comprising a zinc oxide-forming compound other than zinc oxide at conditions effective to form a zinc oxide-forming compound containing coating on at least a portion of said substrate;

forming a liquidus zinc oxide forming compound containing coating on at least a portion of the three dimensions of said substrate including the shielded surfaces of said substrate;

contacting said substrate with at least one dopant forming component at conditions effective to form a dopant component-containing coating on at least a portion of said substrate including at least a portion of the three dimensions of said substrate including the shielded surfaces of said substrate;

said contacting being initiated at least prior to the substantially complete oxidation of said zinc oxide forming compound to zinc oxide and

contacting said substrate having said zinc oxide forming compound containing coating and said dopant component-containing coating thereon with an oxidizing agent at conditions effective to convert said zinc oxide forming compound to zinc oxide and form a doped zinc oxide coating on at least a portion of said three dimensions of said substrate including the shielded surfaces of said substrate.

2. The process of claim 1 wherein said zinc oxide forming compound is selected from the group consisting of zinc chloride, low molecular weight zinc organic salts, low molecular weight zinc organic complexes and mixtures thereof.

3. The process of claim 1 wherein said zinc oxide forming compound is zinc chloride.

4. The process of claim 1 wherein said dopant-forming component is a dopant oxide precursor selected from the group consisting of aluminum, cobalt, gallium, tin, germanium, chromium, titanium and indium.

5. The process of claim 1 wherein said dopant-forming component is a dopant oxide precursor selected from the group consisting of aluminum, gallium and indium.

6. The process of claim 1 where said composition further comprises at least one inhibitor component present in an amount effective to inhibit grain growth in the doped zinc oxide coating.

7. The process of claim 1 wherein said substrate is maintained for a period of time at conditions effective to do at least one of the following:

(1) coat a larger portion of said substrate with said zinc oxide forming compound;

(2) distribute said zinc oxide forming compound over said substrate;

(3) make said zinc oxide forming compound-containing coating more uniform in thickness;

(4) incorporate said dopant component in said zinc oxide forming compound coating; and

(5) distribute said dopant component more uniformly in said zinc oxide forming compound containing coating.

8. The process of claim 1 wherein said substrate is in a form selected from the group consisting of spheres, extrudates, flakes, fibers, fiber rovings, chopped fibers, fiber mats, porous substrates, irregularly shaped particles and multi-channel monoliths.

20. The process of claim 1 wherein said substrate is selected from the group consisting of spheres, extrudates, flakes, fibers, porous substrate, and irregularly shaped particles, and said substrate is substantially non-electrically conductive.

21. The process of claim 1 wherein any one or more of said contacting steps and forming step is conducted under gas fluidizing conditions.

22. The process of claim 1 which further comprises contacting said substrate, with at least one catalyst material at conditions effective to form a coated substrate including a catalyst component in an amount effective to promote a chemical reaction.

9. A process for coating an inorganic three dimensional substrate with zinc oxide comprising:

contacting an inorganic three dimensional substrate which includes external surfaces and shielded portions of said substrate with a composition comprising a zinc chloride-forming compound at conditions effective to form a zinc chloride-forming compound containing coating on at least a portion of said substrate;

forming a liquidus zinc chloride-forming compound containing coating on at least a portion of the three dimensions of said substrate including the shielded surfaces of said substrate and at conditions effective to do at least one of the following;

(1) coat a larger portion of said substrate with said zinc chloride-forming compound;

(2) distribute said zinc chloride-forming compound over said substrate; and

(3) make said zinc chloride-forming compound containing coating more uniform in thickness; and

contacting said substrate with said zinc chloride-forming compound containing coating with an oxidizing agent at conditions effective to convert the zinc chloride forming compound to zinc oxide and form a zinc oxide coating on at least a portion of said three dimensions of said substrate including the shielded surfaces of said substrate.

10. The process of claim 9 which further comprises contacting said substrate with a dopant-forming component at conditions effective to form a dopant-forming component containing coating on said substrate, said dopant forming component contacting occurring prior to substantially complete oxidation of said zinc chloride forming compound to the oxide.

11. The process of claim 10 wherein said substrate is in a form selected from the group consisting of spheres, extrudates, flakes, fibers, fiber rovings, chopped fibers, fiber mats, porous substrates, irregularly shaped particles and multi-channel monoliths.

12. The process of claim 9 wherein any one or more of said contacting steps and said maintaining steps is conducted under gas fluidizing conditions.

23. The process of claim 10 wherein said substrate is in a form selected from the group consisting of spheres, extrudates, flakes, porous substrate, and irregularly shaped particles, and said substrate is substantially non-electrically conductive.

13. A process for coating surfaces of an inorganic three dimensional substrate with zinc oxide which comprises:

contacting an inorganic three dimensional substrate with a composition comprising a zinc oxide precursor powder other than zinc oxide at conditions effective to form a coating containing zinc oxide precursor on at least a portion of the substrate;

forming a liquidus zinc oxide precursor on at least a portion of the three dimensions of said substrate including the shielded surfaces of said substrate and at conditions effective to do at least one of the following;

(1) coat a larger portion of said substrate with said coating containing zinc oxide precursor;

(2) distribute said coating containing zinc oxide precursor over said substrate; and

(3) make said coating containing zinc oxide precursor more uniform in thickness; and

contacting said coated substrate with an oxidizing agent at conditions effective to convert said zinc oxide precursor to zinc oxide on at least a portion of said three dimensions of said substrate and form a substrate having a zinc oxide-containing coating.

14. The process of claim 13 which further comprises contacting said substrate with a dopant-forming component at conditions effective to from a dopant-forming component-containing coating on said substrate, said dopant-forming component contacting occurring prior to the substantially complete oxidation of said zinc oxide precursor to zinc oxide.

15. The process of claim 13 wherein said zinc oxide forming component is selected from the group consisting of zinc chloride, low molecular weight zinc organic salts, low molecular weight zinc organic complexes and mixtures thereof.

16. The process of claim 13 wherein said zinc oxide forming compound is zinc chloride.

17. The process of claim 13 wherein said dopant-forming component is a dopant oxide precursor selected from the group consisting of aluminum, cobalt, gallium, tin, germanium, chromium, titanium and indium.

18. The process of claim 13 wherein said dopant-forming component is a dopant oxide precursor selected from the group consisting of aluminum, gallium and indium.

19. The process of claim 13 wherein any one or more of said contacting steps and said forming step is conducted under gas fluidizing conditions.

24. The process of claim 13 wherein said substrate is selected from the group consisting of spheres, extrudates, flakes, fibers, porous substrate, and irregularly shaped particles and said substrate is substantially non-electrically conductive.