Device and method for scrubbing and cleaning substrate

• US 5,345,639 A
• Filed: 05/28/1993
• Issued: 09/13/1994
• Est. Priority Date: 05/28/1992
• Status: Expired due to Term

• Current Assignee: Tokyo Electron Limited
• Original Assignee: Tokyo Electron Kyushu Limited (Tokyo Electron Limited), Tokyo Electron Limited
• Inventors: Iwasaki, Tatsuya, Satoh, Takami, Anai, Noriyuki, Mizosaki, Kengo, Kitamura, Shinzi, Tomoeda, Takayuki, Tanoue, Kouichi
• Primary Examiner(s): ROBERTS JR, EDWARD
• Application Number:
  US08/069,106
• Time in Patent Office: 473 Days
• Field of Search: 15/88.1, 15/88.2, 15/88.3, 15/77, 15/97.1, 15/102
• US Class Current: 15/88.2
• CPC Class Codes: G02F 1/1333 Constructional arrangements; Manufacturing methodsG02F1/135, G02F1/136 take precedence
• CPC Class Codes: H01L 21/67046 using mainly scrubbing means, e.g. brushes
• CPC Class Codes: H01L 21/67051 using mainly spraying means, e.g. nozzles

Abstract

A substrate scrubbing and cleaning device comprising a mechanism having an upper and a lower brush members for scrubbing both surfaces of an LCD glass substrate, a mechanism for rotating the upper and lower brush members, a mechanism for supplying pure water to the upper and lower brush members, a mechanism for carrying the substrate between the upper and the lower brush members to reciprocate it relative to the upper and lower brush members in a substrate carrying direction, and a controller for controlling the operation of the substrate carrying mechanism.

Claims

1. A substrate scrubbing and cleaning device, comprising:

means having upper and lower brush members for scrubbing both surfaces of a substrate, respectively;

means for rotating the upper and lower brush members, respectively;

means for supplying cleaning solution to the upper and lower brush members, respectively;

means having a pair of belt-driven holding arms, for carrying the substrate between the upper and lower brush members and for reciprocating the substrate relative to the upper and lower brush members in a substrate carrying direction, the substrate being held by said holding arms; and

means for controlling the operation of the substrate carrying means.

2. The device according to claim 1, further comprising nozzle means through which high pressure water is jetted onto the substrate.

3. The device according to claim 1, further comprising nozzle means through which spraying water, to which ultrasonic waves have been applied, is sprayed onto the substrate.

4. The device according to claim 1, further comprising nozzle means through which large amount of rinsing solution is supplied to the substrate.

5. The device according to claim 1, wherein said cleaning solution supply means includes a passage opening at a center of each brush member.

6. The device according to claim 1, wherein the upper brush members are off-set from their adjacent lower brush members in a horizontal plane.

7. The device according to claim 1, further comprising means for holding by suction, lifting and rotating the substrate.

8. A scrubbing and cleaning device comprising:

means having an upper and a lower brush members for scrubbing both surfaces of a substrate, respectively;

means for rotating the upper and lower brush members, respectively;

means for supplying cleaning solution to the upper and lower brush members, respectively;

means having upper rollers each being arranged between the upper brush members and also having lower rollers each being arranged between the lower brush members and serving to carry the substrate between the upper and the lower brush members by the upper and lower rollers;

lift holder means for receiving the substrate from the carrying means to hold and lift the substrate; and

stage means for receiving the substrate from the lift holder means and for rotating the substrate thereon while applying a rinsing solution to the substrate.

9. The device according to claim 8, wherein said lift holder means has members for attracting and holding both side portions of the substrate.