×

Apparatus for plasma enhanced chemical vapor deposition comprising shower head electrode with magnet disposed therein

  • US 5,433,786 A
  • Filed: 12/20/1993
  • Issued: 07/18/1995
  • Est. Priority Date: 08/27/1993
  • Status: Expired due to Term
First Claim
Patent Images

1. An apparatus for generating a plasma which utilizes parallel plate electrodes comprising as the cathode, a planar shower head electrode containing in the shower head, a means for generating a magnetic field above the surface of the cathode, a means for injecting gaseous reactants through the interior of the cathode and out through the surface of said cathode said means directing substantially all of said reactants through said magnetic field and said means for generating a magnetic field comprising a magnet situated internally in said shower head in contact with an inner upper surface of the cathode, said magnet having sufficient strength to generate at least 100 gauss.

View all claims
  • 0 Assignments
Timeline View
Assignment View
    ×
    ×