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Temperature sensor calibration wafer structure and method of fabrication

  • US 5,436,494 A
  • Filed: 01/12/1994
  • Issued: 07/25/1995
  • Est. Priority Date: 01/12/1994
  • Status: Expired due to Term
First Claim
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1. A temperature sensor integrated into a semiconductor wafer such that said temperature sensor is integrated into said semiconductor wafer so that an electrical characteristic of said temperature sensor changes as the temperature of said semiconductor wafer changes, and said temperature sensor comprising:

  • a first conductor, formed from a first conductive material and having a width;

    a second conductor, formed from said first conductive material and having a width approximately equal to the width of said first conductor; and

    a third conductor, formed from a second conductive material, disposed between said first and second conductors, and having a length and a width, said width of said third conductor being less then said width of said first or second conductors and much less then said length of said third conductor;

    wherein the resistance of said third conductor is greater then the resistance of said first or second conductors, and a change in resistance of said first and second conductors due to temperature changes will be much less then the change in resistance of said third conductor due to said temperature change.

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