Triggered vacuum anodic arc
First Claim
1. A low current anodic vacuum arc assembly, comprising:
- a cathode assembly comprising;
a high voltage cathode defining a cavity and an orifice extending through said high voltage cathode to said cavity; and
an initiator electrode positioned proximate said high voltage cathode and insulated from said high voltage cathode; and
an anode assembly comprising;
a continuous, consumable anode having a free end, said free end of said anode positioned within said cavity of said high voltage cathode in close juxtaposition with said initiator electrode and said orifice.
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Accused Products
Abstract
An anodic vacuum arc deposition system for rapidly depositing a high quality, small grain size, coating on a workpiece. The anodic vacuum arc deposition system includes an arc initiator and an anodic electrode having a continuous feed. The anodic vacuum arc deposition system may be configured with a coaxial anode and cathode. A plurality of coaxial electrodes may used to deposition-coat a large area and/or to sequentially deposit a series of layers each of a different material. In one embodiment, a low current triggered anodic vacuum arc with a continuous wire feed mechanism provides the user with a self-contained high differential metal plasma spray. This apparatus provides coatings with properties similar to coatings from a basic anodic arc deposition source but can be self-ignited, continuously run, and made highly mobile for greater coverage control. An alternative embodiment of this device incorporates a cathodic arc source which supplies ions to both ignite the anodic arc and to enhance the ion population of the anodic arc metal flux for greater control over the deposition process via substrate biasing and magnetic focusing, and the degree of ionization at the substrate.
28 Citations
25 Claims
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1. A low current anodic vacuum arc assembly, comprising:
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a cathode assembly comprising; a high voltage cathode defining a cavity and an orifice extending through said high voltage cathode to said cavity; and an initiator electrode positioned proximate said high voltage cathode and insulated from said high voltage cathode; and an anode assembly comprising; a continuous, consumable anode having a free end, said free end of said anode positioned within said cavity of said high voltage cathode in close juxtaposition with said initiator electrode and said orifice. - View Dependent Claims (2, 3, 4)
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5. A triggered anodic arc deposition system for depositing material onto a substrate, comprising:
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a vacuum chamber; a cathode assembly comprising; a high voltage cathode defining a cavity and an orifice extending through said high voltage cathode to said cavity; and an initiator electrode positioned proximate said high voltage cathode and insulated from said high voltage cathode; and an anode assembly comprising; a continuous, consumable anode having a free end, said free end of said anode positioned within said cavity of said high voltage cathode in close juxtaposition with said initiator electrode and said orifice, said continuous, consumable anode, in use, forming a liquid region from which the deposition material is vaporized and deposited onto said substrate. - View Dependent Claims (6, 7, 8)
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9. A low current anodic vacuum arc assembly, comprising:
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a cathode assembly comprising; a cup-shaped high voltage cathode defining a cavity and an orifice extending through said cathode into said cavity; and an initiator electrode positioned on the inner surface of said cup-shaped high voltage cathode and adjacent said orifice; and an anode assembly comprising; a continuous, consumable anode having a free end, said free end of said anode positioned within said cup-shaped cathode in close juxtaposition with said initiator electrode and said orifice. - View Dependent Claims (10, 11)
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12. An anodic vacuum arc, assembly having an anode, a cathode, and a power supply, said power supply comprising:
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a power source having a first terminal and a second terminal, said second terminal in electrical communication with said anode; an inductor having a first terminal and a second terminal, said first terminal in electrical communication with said first terminal of said power source, said second terminal of said inductor in electrical communication with said cathode; and a spark gap having a first terminal in electrical communication with said cathode and a second terminal in electrical communication with ground. - View Dependent Claims (13, 14, 15)
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16. A triggered anodic arc deposition system for depositing material onto a substrate, comprising:
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a vacuum chamber; a cathode assembly comprising; a cup-shaped high voltage cathode defining a cavity and an orifice extending through said cathode into said cavity; and an initiator electrode positioned proximate said high voltage cathode; and an anode assembly comprising; a continuous, consumable anode having a free end, said free end of said anode positioned within said cup-shaped cathode in close juxtaposition with said initiator electrode and said orifice, said continuous, consumable anode, in use, forming a liquid region from which the deposition material is vaporized and deposited onto a substrate, said anode assembly and said cathode assembly mounted on a robotic arm. - View Dependent Claims (17, 18, 19)
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20. A deposition system for depositing a material on a substrate, comprising:
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a vacuum chamber; an anodic arc source positioned within said vacuum chamber, said anodic arc source comprising an anode and a cathode; a cathodic arc ion source comprising an ion generator; a curved magnetic duct having a first end and a second end, said cathodic arc ion source positioned within said first end of said magnetic duct, said second end of said magnetic duct opening into said vacuum chamber, said magnetic duct comprising a curved tube surrounded by coils of wire positioned to generate a solenoidal magnetic field within said curved tube, said magnetic field adjustable to select ions generated by said cathodic arc source having a predetermined energy, said selected ions thereby flowing through said magnetic duct into said vacuum chamber and impinging on said substrate. - View Dependent Claims (21, 22, 23)
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24. A deposition system for depositing carbon nitride on a substrates, comprising:
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a vacuum chamber; an anodic arc source positioned within said vacuum chamber, said anodic arc source comprising an anode and a cathode; a cathodic arc ion source comprising a carbon ion generator; a curved magnetic duct having a first end and a second end, said cathodic arc ion source positioned within said first end of said magnetic duct, said second end of said magnetic duct opening into said vacuum chamber, said magnetic duct comprising a curved tube surrounded by coils of wire positioned to generate a solenoidal magnetic field within said curved tube, said magnetic field adjustable to select ions generated by said cathodic arc source having a predetermined energy, said selected ions thereby flowing through said magnetic duct into said vacuum chamber and impinging on said substrate; and a working gas source, wherein said working gas is N2.
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25. A deposition system for depositing titanium nitride on a substrate, comprising:
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a vacuum chamber; an anodic arc source positioned within said vacuum chamber, said anodic arc source comprising an anode and a cathode; a cathodic arc ion source comprising a titanium ion generator; a curved magnetic duct having a first end and a second end, said cathodic arc ion source positioned within said first end of said magnetic duct, said second end of said magnetic duct opening into said vacuum chamber, said magnetic duct comprising a curved tube surrounded by coils of wire positioned to generate a solenoidal magnetic field within said curved tube, said magnetic field adjustable to select ions generated by said cathodic arc source having a predetermined energy, said selected ions thereby flowing through said magnetic duct into said vacuum chamber and impinging on said substrate; and a working gas source, wherein said working gas is N2.
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Specification