Automatically adjustable brush assembly for cleaning semiconductor wafers

• US 5,475,889 A
• Filed: 07/15/1994
• Issued: 12/19/1995
• Est. Priority Date: 07/15/1994
• Status: Expired due to Term

• Current Assignee: Lam Research Corporation
• Original Assignee: OnTrak Systems, Inc. (Lam Research Corporation)
• Inventors: Ryle, Lynn, Thrasher, David L.
• Primary Examiner(s): ROBERTS JR, EDWARD
• Application Number:
  US08/275,774
• Time in Patent Office: 522 Days
• Field of Search: 15/21.1, 15/88.2, 15/88.3, 15/77, 15/102, 15/309.2
• US Class Current: 15/88.3
• CPC Class Codes: B08B 1/32 using rotary cleaning members
• CPC Class Codes: B21B 45/06 of strip material B21B45/08 takes precedence
• CPC Class Codes: H01L 21/67046 using mainly scrubbing means, e.g. brushes

Abstract

An automatically adjustable brush assembly for cleaning semiconductor wafers. The brush assembly includes a first rotary brush, a brush carriage having first and second arms and a second rotary brush, and at least one pressure adjustment assembly positioned to engage at least one of the arms of the brush carriage and configured for automatically adjusting the pressure applied to the wafer surfaces by the first and second rotary brushes. The brush assembly further includes a control system coupled to the pressure adjustment assembly for controlling operation of the pressure adjustment assembly to selectively increase and decrease the pressure applied to the wafer by the first and second rotary brushes.

Claims

1. An automatically adjustable brush assembly for cleaning semiconductor wafers comprising:

a first rotary brush carried by a frame;

a brush carriage having first and second arms pivotally coupled to said frame and a second rotary brush coupled to said first and second arms and extending transversely between said arms parallel to said first rotary brush, said second rotary brush being spaced from said first rotary brush by a distance such that during operation of said brush assembly, said first and second rotary brushes apply a selected cleaning pressure to a semiconductor wafer positioned between said first and second rotary brushes;

at least one support assembly positioned to engage one of said arms and support said brush carriage in one of a plurality of positions, said support assembly being configured for reciprocating movement of said brush carriage between said plurality of positions to selectively increase and decrease said distance between said first and second rotary brushes, said support assembly engaging a portion of said one of said arms spaced from the portion of said one of said arms pivotally coupled to said frame; and

a control system coupled to said support assembly for controlling operation of said support assembly for moving said brush carriage to a selected one of said plurality of positions.

2. The brush assembly of claim 1 in which said support assembly is positioned to engage said first support arm, and further comprising a second support assembly positioned to engage a portion of said second arm spaced from the portion of said second arm pivotally coupled to said frame.

3. The brush assembly of claim 1 in which said support assembly includes a stepping motor and a support pin engaging said one of said arms and coupled to said stepping motor for reciprocating linear movement of said support pin relative to the revolution of said stepping motor to support said brush carriage in said one of said plurality of positions.

4. The brush assembly of claim 1 in which said first and second rotary brushes comprise a roller and a sleeve mounted to said roller.

5. The brush assembly of claim 1 in which said control system is configured for controlling operation of said support assembly to decrease said distance between said first and second rotary brushes in accordance with a predetermined schedule.

6. The brush assembly of claim 1, and further comprising at least one sensor assembly coupled to said control system and one of said arms for determining the actual pressure applied to said wafer by said first and second rotary brushes.

7. The brush assembly of claim 6 in which said control system is configured for comparing said actual pressure with said selected pressure and actuating said support assembly to move said brush carriage to another of said plurality of said positions to adjust the pressure applied to said wafer by said first and second rotary brushes.

8. The brush assembly of claim 1 in which said second rotary brush is coupled to said one of said arms at a position between the portion of said arm pivotally coupled to said frame and the portion of said arm engaged by said support assembly.

9. An automatically adjustable brush assembly for cleaning semiconductor wafers comprising:

a first rotary brush;

a brush carriage having first and second arms and a second rotary brush extending between said arms parallel to said first rotary brush, said second rotary brush being spaced from said first rotary brush by a distance such that during operation of said brush assembly, said first and second rotary brushes apply a selected cleaning pressure to a semiconductor wafer positioned between said first and second rotary brushes;

first and second support assemblies positioned to engage said first arm and said second arm, respectively, and support said brush carriage in one of a plurality of positions, said support assemblies each being configured for reciprocating movement of said brush carriage between said plurality of positions to selectively increase and decrease said distance between said first and second rotary brushes; and

a control system coupled to said support assemblies for controlling operation of each of said support assemblies for moving said brush carriage to a selected one of said plurality of positions;

said second rotary brush being pivotally mounted to said first and second arms for multidirectional movement of said second rotary brush relative to said first and second arms.

10. The brush assembly of claim 9 in which said brush carriage includes a pair of spherical bearings pivotally mounting said second rotary brush to said first and second arms.

11. An automatically adjustable brush assembly for cleaning semiconductor wafers comprising:

a first rotary brush carried by a frame;

a brush carriage having first and second arms pivotally coupled to said frame and a second rotary brush extending transversely between said arms parallel to and spaced from said first rotary brush so that during operation of said brush assembly, said first and second rotary brushes apply a cleaning pressure to a semiconductor wafer positioned between said first and second rotary brushes;

at least one pressure adjustment assembly engaging one of said first and second arms of said brush carriage with the engaged portion of said one of said arms being spaced from said second rotary brush, said pressure adjustment assembly being configured for automatically adjusting the pressure applied to said wafer by said first and second rotary brushes; and

a control system coupled to said pressure adjustment assembly for controlling operation of said pressure adjustment assembly to selectively increase and decrease the pressure applied to said wafer by said first and second rotary brushes.

12. The brush assembly of claim 11, in which said pressure adjustment assembly comprises a support assembly positioned to engage one of said arms of said brush carriage and support said brush carriage in a selected one of a plurality of positions, said support assembly being configured for reciprocating movement of said brush carriage between said plurality of positions to selectively increase and decrease said distance between said first and second rotary brushes.

13. The brush assembly of claim 11, in which said pressure adjustment assembly includes a motor coupled to said one of said arms at a position spaced from said second rotary brush for applying torque to said one of said arms to selectively increase and decrease the pressure applied to said wafer by said first and second rotary brushes.

14. The brush assembly of claim 13, and further comprising a sensor assembly coupled to said brush carriage and said control system for measuring the pressure applied to said wafer, and in which said control system is configured for receiving a signal from said sensor assembly and controlling said motor to selectively increase and decrease the torque applied to said one of said arms.

15. The brush assembly of claim 11, in which said pressure adjustment assembly is positioned to engage said first arm, and further comprising a second pressure adjustment assembly positioned to engage a portion of said second arm spaced from said second rotary brush.

16. The brush assembly of claim 11, and further comprising at least one sensor assembly coupled to said control system and one of said arms for determining the actual pressure applied to said wafer by said first and second rotary brushes.

17. The brush assembly of claim 16 in which said sensor assembly is configured for detecting the deflection of said one of said arms relative to said frame during operation of said brush assembly.

18. The brush assembly of claim 17 in which said control system is configured for calculating the actual pressure applied to said wafer from said deflection of said arm, comparing said actual pressure with the selected pressure, and initiating operation of said pressure adjustment assembly to selectively increase and decrease the pressure applied to said wafer by said first and second rotary brushes.

19. The brush assembly of claim 17 in which said sensor assembly includes a spring coupled to said one of said arms.

20. The brush assembly of claim 17 in which said sensor assembly comprises a bellows assembly coupled to said one of said arms.

21. An automatically adjustable brush assembly for cleaning semiconductor wafers comprising:

a first rotary brush;

a brush carriage having first and second arms and a second rotary brush extending between said arms parallel to and spaced from said first rotary brush so that during operation of said brush assembly, said first and second rotary brushes apply a cleaning pressure to a semiconductor wafer positioned between said first and second rotary brushes;

first and second pressure adjustment assemblies each engaging one said arms of said brush carriage, said pressure adjustment assemblies being configured for automatically adjusting the pressure applied to said wafer by said first and second rotary brushes; and

a control system coupled to said pressure adjustment assemblies for controlling operation of each of said pressure adjustment assemblies to selectively increase and decrease the pressure applied to said wafer by said first and second rotary brushes;

said second rotary brush being pivotally mounted to said first and second arms for multidirectional movement of said rotary brush relative to said first and second arms.