Method of correcting non-uniform diffraction efficiency in a binary diffractive optical element

• US 5,494,783 A
• Filed: 12/27/1994
• Issued: 02/27/1996
• Est. Priority Date: 12/27/1994
• Status: Expired due to Fees

• Current Assignee: Xerox Corporation (Xerox Holdings Corp.)
• Original Assignee: Xerox Corporation (Xerox Holdings Corp.)
• Inventors: Harris, Ellis D.
• Primary Examiner(s): Loney, Donald J.
• Application Number:
  US08/364,903
• Time in Patent Office: 427 Days
• Field of Search: 359/454, 359/457, 359/463, 359/465, 359/565, 359/566, 359/569, 359/573, 359/576, 359/197, 264/1.7, 264/1.9, 264/1.6, 264/40.01, 430/321, 430/322, 156/99
• US Class Current: 430/321
• CPC Class Codes: G02B 5/1876 Diffractive Fresnel lenses; Zone plates; Kinoforms G02B5/1842, G02B5/1847 take precedence; optical systems having diffractive correction means G02B27/0037; Fresnel lenses operating by refraction G02B3/08

Abstract

A first binary diffractive optical element has a multi-level surface relief phase grating structure on a substrate. The first binary diffractive optical element can be divided into regions commensurate with resolution requirements of the intended optical application and the diffraction efficiency of each region of the binary diffractive optical element measured. The lowest measured diffraction efficiency for a region of the first binary diffractive optical element will be taken as the reference efficiency. The diffraction efficiencies for all the regions of the binary diffractive optical element will be reduced region by region to the common value of the lowest measured diffraction efficiency by introducing compensating diffractive losses to the regions by a second, corrector binary diffractive optical element which has a binary surface relief phase grating structure on a substrate. By closely spacing the two binary diffractive optical elements in the optical path of an incident light beam, the resulting diffracted beam will have a uniform diffraction efficiency.

Claims

1. A method for providing a uniform diffraction efficiency to a diffracted beam comprising

fabricating a first binary diffractive optical element having a multiple level surface relief phase grating structure on a substrate, said grating structure of said first binary diffractive optical element being divided into regions, each of said regions having a diffraction efficiency for said diffracted beam,

measuring the diffraction efficiency of each of said regions of said first binary diffractive optical element,

fabricating a second binary diffractive optical element having a binary level surface relief phase grating structure on a second substrate, said grating structure of said second binary diffractive optical element being divided into regions corresponding to said regions of said first binary diffractive optical element, said regions inducing loss to said diffracted beam such that for each region said diffraction efficiency and said loss equal the lowest diffraction efficiency of said regions of said first binary diffractive optical element, and

assembling said first binary diffractive optical element and said second binary diffractive optical element closely spaced together such that said region of said first binary diffractive optical element is in the same optical path of said diffracted beam as the corresponding region of said second binary diffractive optical element.

2. The method for providing a uniform diffraction efficiency to a diffracted beam of claim 1 further comprising fabricating said multiple level surface relief phase grating structure of said first binary diffractive optical element within a first recess in said substrate of said first binary diffractive optical element and fabricating said binary level surface relief phase grating structure of said second binary diffractive optical element within a second recess in said substrate of said second binary diffractive optical element and assembling said first binary diffractive optical element and said second binary diffractive optical element such that first recess and said second recess are common.

3. The method for providing a uniform diffraction efficiency to a diffracted beam of claim 1 further comprising fabricating said multiple level surface relief phase grating structure of said first binary diffractive optical element within a recess in said substrate of said first binary diffractive optical element.

4. The method for providing a uniform diffraction efficiency to a diffracted beam of claim 1 further comprising fabricating said binary level surface relief phase grating structure of said second binary diffractive optical element within a recess in said substrate of said second binary diffractive optical element.

5. The method for providing a uniform diffraction efficiency to a diffracted beam of claim 1 further comprising

coating said first and said second binary diffractive optical element with an antireflective coating.

6. The method for providing a uniform diffraction efficiency to a diffracted beam of claim 1 wherein said multiple level surface relief phase grating structure of said first binary diffractive optical element and said binary level surface relief phase grating structure of said second binary diffractive optical element are exterior surfaces.