Positive type anionic electrodeposition photo-resist composition and process for pattern formation using said composition

  • US 5,624,781 A
  • Filed: 05/27/1994
  • Issued: 04/29/1997
  • Est. Priority Date: 05/28/1993
  • Status: Expired due to Fees
First Claim
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1. A positive anionic electrodeposition photoresist composition comprising, as a main component, a water-dispersible resin composition obtained by neutralizing, with a base, an admixture comprising:

  • (A) an acrylic resin containing carboxyl group(s) in an amount of 0.7-3.5 moles per kg of the resin and hydroxyl group(s) in an amount of 0.5-3.5 moles per kg of the resin and having a number-average molecular weight of 10,000-100,000,(B) a vinylphenol resin containing a unit represented by formula (I) ##STR6## in an amount of at least 25% by weight based on the resin and having a number-average molecular weight of 1,000-25,000, said vinylphenol resin being free from a photosensitive o-quinone diazide residue, and(C) an ester between a polyhydroxybenzophenone and 1,2-naphthoquinone diazide sulfonic acid or benzoquinone diazide sulfonic acid, and dispersing the resulting neutralization product in water.

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