Plasma processing system for transmission electron microscopy specimens and specimen holders

  • US 5,633,502 A
  • Filed: 08/11/1995
  • Issued: 05/27/1997
  • Est. Priority Date: 08/11/1995
  • Status: Expired due to Term
First Claim
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1. A plasma processing apparatus for removing at least one of contamination and damage from at least one of transmission electron microscopy specimens and specimen holders, comprising:

  • (a) a plasma chamber into which a preselected process gas is flowed and into which at least one of a specimen and specimen holder are inserted;

    (b) an oil-free vacuum system for evacuating said plasma chamber; and

    (c) an oscillating field generated adjacent said plasma chamber, said oscillating field and said preselected process gas combining to form a low energy, high frequency plasma within said plasma chamber.

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