Apparatus and method for actively controlling the DC potential of a cathode pedestal

• US 5,737,177 A
• Filed: 10/17/1996
• Issued: 04/07/1998
• Est. Priority Date: 10/17/1996
• Status: Expired due to Term

• Current Assignee: Applied Materials Incorporated
• Original Assignee: Applied Materials Incorporated
• Inventors: Contreras, Mark Steven, Salimian, Siamak, Dahimene, Mahmoud, Luscher, Paul E., Mett, Richard Raymond
• Primary Examiner(s): Gaffin, Jeffrey A.
• Assistant Examiner(s): Huynh, Thuy-Trang
• Application Number:
  US08/730,885
• Time in Patent Office: 537 Days
• Field of Search: 279/128, 361/230, 361/233, 361/234, 361/235
• US Class Current: 361/234
• CPC Class Codes: H01L 21/6833 Details of electrostatic chucks
• CPC Class Codes: Y10T 279/23 with magnetic or electrostatic means

Abstract

A method and apparatus for actively controlling the DC cathode potential of a wafer support pedestal within a semiconductor wafer processing system. The apparatus contains a variable DC power supply coupled through an RF filter to a cathode pedestal. The variable DC power supply is actively controlled by a control signal generated by a cathode bias control unit, e.g., a computer or other control circuitry. The cathode bias control unit can be as simple as an operator adjustable control signal, e.g., a rheostat. However, for more accurate control of the DC power supply, a feedback circuit is used that generates a control signal that is proportional to the peak-to-peak voltage on a cathode pedestal. The application of the DC bias to the pedestal reduces the DC potential difference between the wafer and the cathode and, thereby avoids arcing from the wafer to the pedestal.

Claims

1. Apparatus for controlling a DC potential on a cathode pedestal used to support a workpiece, comprising:

a variable DC power supply coupled to said cathode pedestal;

a cathode bias control unit, coupled to said variable DC power supply, for generating a control signal that causes said DC power supply to produce a particular DC voltage, said control signal being generated in response to indicia of arcing potential between said workpiece and said cathode pedestal.

2. The apparatus of claim 1 wherein said indicia of arcing potential is a peak-to-peak voltage on said cathode pedestal.

3. The apparatus of claim 2 wherein said cathode bias unit comprises:

a peak-to-peak voltage detector for producing a peak-to-peak value of said AC voltage signal; and

a transfer function generator, coupled to said peak-to-peak detector, for producing said control signal in response to said peak-to-peak value.

4. The apparatus of claim 3 further comprising an RF probe, coupled to said cathode pedestal, for generating said AC voltage signal.

5. The apparatus of claim 3 wherein said transfer function generator produces the control signal as 1.43 (V_pp /2)-505, where V_pp is the peak-to-peak value.

6. The apparatus of claim 3 wherein said peak-to-peak detector further comprises:

a positive peak detector producing a positive peak voltage;

a negative peak detector producing a negative peak voltage; and

a differential amplifier, coupled to said positive peak detector and said negative peak detector, for producing said peak-to-peak value.

8. The apparatus of claim 6 wherein said transfer function generator produces the control signal as 1.43 (V_pp /2)-505, where V_pp is the peak-to-peak value.

7. Apparatus for controlling a DC potential on a cathode pedestal used to support a workpiece, comprising:

a variable DC power supply, coupled to said cathode pedestal, for applying a DC voltage to the cathode pedestal in response to a control voltage;

an RF probe, coupled to said cathode pedestal, for generating an AC voltage signal;

a positive peak detector, coupled to said RF probe, for producing a positive peak voltage;

a negative peak detector, coupled to said RF probe, for producing a negative peak voltage;

a differential amplifier, coupled to said positive peak detector and said negative peak detector, for producing a peak-to-peak value of said AC voltage signal; and

a transfer function generator, coupled to said differential amplifier, for producing said control signal in response to said peak-to-peak value.

9. A method of controlling a DC potential on a cathode pedestal used to support a workpiece, comprising the steps of:

detecting an indicia of arcing between the workpiece and pedestal;

generating, in response to said indicia of arcing, a DC voltage having a magnitude that reduces the probability of arcing; and

applying said DC voltage to said cathode pedestal.

10. The method of claim 9 wherein said indicia of arcing is a peak-to-peak voltage on said cathode pedestal.

11. The method of claim 9 wherein said generating step further comprises:

processing said peak-to-peak voltage using a transfer function to produce a control voltage; and

controlling, in response to said control voltage, the magnitude of said DC voltage.

12. The method of claim 9 wherein said DC voltage magnitude is proportional to the peak-to-peak voltage on said cathode pedestal.

13. The method of claim 11 wherein said transfer function produces the control signal as 1.43 (V_pp /2)-505, where V_pp is the peak-to-peak value.